Characterization of boron-doped ZnO thin films prepared by magnetron sputtering with (100-x)ZnO-xB2O3 ceramic targets

Thin Solid Films

Volumn 583, Issue 1, 2015, Pages 205-211

  Wong, Lian Hong ^a   Lai, Yi Sheng ^a  

^a NATIONAL UNITED UNIVERSITY   (Taiwan)

Author keywords

Boron doped zinc oxide; Ceramic target; Magnetron sputtering; Transparent conductive oxide

Indexed keywords

CERAMIC MATERIALS; CRYSTAL STRUCTURE; MAGNETRON SPUTTERING; METALLIC FILMS; OXIDE FILMS; SEMICONDUCTOR DOPING; THIN FILMS; ZINC; BALLOONS;

BORON CONTENT; BORON-DOPED; CERAMIC TARGET; EFFECTIVE DOPING; ELECTRICAL BEHAVIORS; RADIO FREQUENCY MAGNETRON SPUTTERING; TRANSPARENT CONDUCTIVE OXIDES; VISIBLE TRANSMITTANCE;

ZINC OXIDE;

EID: 84933059397     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2015.04.003     Document Type: Article

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