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Volumn 518, Issue 21, 2010, Pages 6071-6075

Highly conductive alumina-added ZnO ceramic target prepared by reduction sintering and its effects on the properties of deposited thin films by direct current magnetron sputtering

(7) Huang, H S a Tung, H C a Chiu, C H a Hong, I T a Chen, R Z a Chang, J T a Lin, H K b

a CHINA STEEL CORPORATION (Taiwan)

b NATIONAL CENTRAL UNIVERSITY (Taiwan)

Author keywords

Aluminum doped zinc oxide (AZO); Conductivity; Direct current magnetron sputtering; Sintering; Sputtering target; Thin film; Transparent conducting oxide

Indexed keywords

ALUMINUM-DOPED ZINC OXIDE; CONDUCTIVITY; DIRECT CURRENT MAGNETRON SPUTTERING; SPUTTERING TARGET; TRANSPARENT CONDUCTING OXIDE;

ALUMINUM; CARRIER CONCENTRATION; CERAMIC MATERIALS; CONDUCTIVE FILMS; MAGNETRON SPUTTERING; OXYGEN; OXYGEN VACANCIES; SINTERED ALUMINA; SIZE DISTRIBUTION; TARGETS; THIN FILMS; VAPOR DEPOSITION; ZINC; ZINC OXIDE;

SINTERING;

EID: 77955557023 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2010.06.004 Document Type: Article

Times cited : (38)

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