Study of high-density AZO ceramic target

Materials Science in Semiconductor Processing

Volumn 14, Issue 3-4, 2011, Pages 189-192

  Zhang, Jing ^a   Zhang, Weijia ^a   Zhao, Erjing ^a   Jacques, Havugimana Jean ^a  

^a BEIHANG UNIVERSITY   (China)

Author keywords

AZO target; Relative density; Sintering temperature

Indexed keywords

ALUMINUM-DOPED ZINC OXIDE; CERAMIC TARGET; CHEMICAL COPRECIPITATION METHOD; ELECTRICAL PROPERTY; FREE ELECTRON; HALL TEST; HIGH-DENSITY; LOW RESISTIVITY; MASS LOSS RATE; MEASURED RESULTS; RELATIVE DENSITY; SINTERING TEMPERATURE; SINTERING TEMPERATURES; SPECIFIC AREAS; XRD;

ATMOSPHERIC PRESSURE; ELECTRIC PROPERTIES; GALLIUM; NIOBIUM; NIOBIUM OXIDE; OXYGEN VACANCIES; POWDERS; ZINC; ZINC OXIDE;

SINTERING;

EID: 82455171939     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2011.02.004     Document Type: Review

References (9)

1. J. Nomoto, M. Konagai, K. Okada, and T. Minami Thin Solid Films 518 2010 2937 2940
2. R.F. Silva, and E.D. Zaniquelli Thin Solid Films 449 2004 86 93
3. B.Y. Oh, M.C. Jeong, and J.M. Myoung Appl Surf Sci 253 2007 7157 7161
4. G.J. Fang, D.J. Li, and B.L. Yao Vacuum 68 2003 363 372
5. S. Major, S. Kumar, M. Bhatnagar, and K.L. Chapra Appl Phys Lett 493 1986 94
6. C.M. Lee, Y.P. Su, J.M. Lim, and W.K. Hyoun Mater Lett 61 2007 2495 2498
7. H. Gómez-Pozos, A. Maldonado, and M.L. de la Olvera Mater Lett 61 2007 1460 1464
8. S.H. Jeong, and J.H. Boo Thin Solid Films 447-448 2004 105 110
9. Z.Z. Ye, J.G. Lv, Y.Z. Zhang, and H.P. He ZnO: Doping and Application 2009 Zhejiang University Press Hangzhou