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Thin Solid Films

Volumn 520, Issue 18, 2012, Pages 5960-5964

Transparent conductive ZnO:B films deposited by magnetron sputtering

(6) Huang, Qian a Wang, Yanfeng a Wang, Shuo a Zhang, Dekun a Zhao, Ying a Zhang, Xiaodan a

a NANKAI UNIVERSITY (China)

Author keywords

Boron; Deposition conditions; Doped films; Electrical properties; Optical band gap; Sputtering; Zinc oxide

Indexed keywords

ABSORPTION EDGES; ADJUSTING POWER; BAND GAP RENORMALIZATION; BLUE SHIFT; BORON-DOPED; BURSTEIN-MOSS EFFECTS; CERAMIC TARGET; DEPOSITION CONDITIONS; DOPED FILMS; FREE EXCITONS; GROWTH CONDITIONS; HIGH TRANSPARENCY; LATTICE STRUCTURES; LOW RESISTIVITY; MID-FREQUENCY; OPTICAL BANDS; PHOTOLUMINESCENCE SPECTRUM; TRANSMISSION SPECTRUMS; TRANSPARENT CONDUCTIVE; UV EMISSIONS; UV PHOTOLUMINESCENCE; ZNO;

BORON; CONDUCTIVE FILMS; ELECTRIC PROPERTIES; HYDROGEN; MAGNETRON SPUTTERING; OPTICAL BAND GAPS; PHOTOLUMINESCENCE; SEMICONDUCTOR DOPING; SPUTTERING; TRANSPARENCY; ZINC OXIDE;

FILM PREPARATION;

EID: 84862163671 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2012.05.014 Document Type: Article

Times cited : (37)

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