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Volumn 52, Issue 6 PART 1, 2013, Pages

Effects of doping ratio and thermal annealing on structural and electrical properties of boron-doped ZnO thin films by spray pyrolysis

(8) Yu, Cheng Chang a Hsu, Yu Ting a Lee, Shao Yi b Lan, Wen How b Kuo, Hsin Hui b Shih, Ming Chang b Feng, David Jui Yang b Huang, Kai Feng a

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

b NATIONAL UNIVERSITY OF KAOHSIUNG (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTION MECHANISM; GLASS SUBSTRATES; HIGH ACTIVATION ENERGY; MEASUREMENT TEMPERATURES; SHALLOW DONORS; SHALLOW LEVELS; STRUCTURAL AND ELECTRICAL PROPERTIES; THERMAL-ANNEALING;

CARRIER CONCENTRATION; METALLIC FILMS; OPTICAL FILMS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; SPRAY PYROLYSIS; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION; ZINC;

ELECTRIC PROPERTIES;

EID: 84881034765 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.7567/JJAP.52.065502 Document Type: Article

Times cited : (6)

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