Aluminum doped zinc oxide sputtering targets obtained from nanostructured powders: Processing and application

Journal of the European Ceramic Society

Volumn 32, Issue 16, 2012, Pages 4381-4391

  Neves, Nuno ^a,b   Barros, Raquel ^a,b   Antunes, Elsa ^a   Calado, João ^a   Fortunato, Elvira ^b   Martins, Rodrigo ^b   Ferreira, Isabel ^b  

^a INNOVNANO   (Portugal)

^b Center of Excellence in Microelectronics Optoelectronics and Processes   (Portugal)

Author keywords

Aluminum doped zinc oxide (AZO); Electrical conductivity; Films; Final microstructure; Sintering

Indexed keywords

AL-DOPED ZNO; AL-METAL; ALUMINUM-DOPED ZINC OXIDE; CERAMIC TARGET; CONVENTIONAL SINTERING; ELECTRICAL CONDUCTIVITY; ELECTRICAL RESISTIVITY; ELECTROOPTICAL PROPERTIES; NANO-STRUCTURED; NANOSTRUCTURED POWDERS; PATENTED PROCESS; PHOTOVOLTAIC; PRODUCTION COST; ROOM TEMPERATURE; SPUTTERING TARGET; VISIBLE RANGE; ZNO;

ALUMINUM; CERAMIC MATERIALS; ELECTRIC CONDUCTIVITY; EMULSIFICATION; FILMS; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; OPTICAL FILMS; OPTICAL PROPERTIES; ZINC OXIDE;

SINTERING;

EID: 84866839575     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jeurceramsoc.2012.08.007     Document Type: Article

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