Fabrication and characterization of transparent conductive ZnO:Al thin films prepared by direct current magnetron sputtering with highly conductive ZnO(ZnAl2O4) ceramic target

Journal of Crystal Growth

Volumn 247, Issue 3-4, 2003, Pages 393-400

  Fang, Guojia ^a,b   Li, Dejie ^a   Yao, Bao Lun ^a  

^a TSINGHUA UNIVERSITY   (China)

^b HUBEI UNIVERSITY OF ARTS AND SCIENCE   (China)

Author keywords

A1. Crystal structure; A3. Polycrystalline deposition; B1. Zinc compounds; B2. Semiconducting II VI materials

Indexed keywords

ANNEALING; CARRIER CONCENTRATION; CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY OF SOLIDS; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; POLYCRYSTALLINE MATERIALS; SPECTRUM ANALYSIS; SUBSTRATES; ZINC OXIDE;

GLASS SHEETS;

CONDUCTIVE FILMS;

EID: 0037212065     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(02)02012-2     Document Type: Article

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