-
1
-
-
84880272590
-
Novel gate-recessed vertical InAs/GaSb TFETs with record high ION of 180 A/m at VDS = 0. 5 v
-
San Francisco, CA, USA
-
G. Zhou et al., "Novel gate-recessed vertical InAs/GaSb TFETs with record high ION of 180 A/m at VDS = 0. 5 V," in Proc. IEEE Int. Electron Devices Meeting (IEDM), San Francisco, CA, USA, 2012, pp. 32-36.
-
(2012)
Proc. IEEE Int. Electron Devices Meeting (IEDM)
, pp. 32-36
-
-
Zhou, G.1
-
2
-
-
84926441073
-
Design options for heterojunction tunnel FETs with high on current and steep sub-VT slope
-
San Francisco, CA, USA
-
S. Brocard, M. Pala, and D. Esseni, "Design options for heterojunction tunnel FETs with high on current and steep sub-VT slope," in Proc. IEEE Int. Electron Devices Meeting (IEDM), San Francisco, CA, USA, 2012, pp. 5. 4. 1-5. 4. 4.
-
(2012)
Proc. IEEE Int. Electron Devices Meeting (IEDM)
, pp. 541-544
-
-
Brocard, S.1
Pala, M.2
Esseni, D.3
-
3
-
-
84862801625
-
Performance of AlGaSb/InAs TFETs with gate electric field and tunneling direction aligned
-
May
-
Y. Lu et al., "Performance of AlGaSb/InAs TFETs with gate electric field and tunneling direction aligned," IEEE Electron Device Lett., vol. 33, no. 5, pp. 655-657, May 2012.
-
(2012)
IEEE Electron Device Lett.
, vol.33
, Issue.5
, pp. 655-657
-
-
Lu, Y.1
-
4
-
-
84879986171
-
Tunneling transistors based on graphene and 2-D crystals
-
Jul.
-
D. Jena, "Tunneling transistors based on graphene and 2-D crystals," Proc. IEEE, vol. 101, no. 7, pp. 1585-1602, Jul. 2013.
-
(2013)
Proc. IEEE
, vol.101
, Issue.7
, pp. 1585-1602
-
-
Jena, D.1
-
5
-
-
84882299765
-
Band alignment of two-dimensional transition metal dichalcogenides: Application in tunnel field effect transistors
-
Jul.
-
C. Gong et al., "Band alignment of two-dimensional transition metal dichalcogenides: Application in tunnel field effect transistors," Appl. Phys. Lett., vol. 103, no. 5, Jul. 2013, Art. ID 053513.
-
(2013)
Appl. Phys. Lett.
, vol.103
, Issue.5
-
-
Gong, C.1
-
6
-
-
84880747583
-
Using dimensionality to achieve a sharp tunneling FET (TFET) turn-on
-
Santa Barbara, CA, USA
-
S. Agarwal and E. Yablonovitch, "Using dimensionality to achieve a sharp tunneling FET (TFET) turn-on," in Proc. 69th Annu. Device Res. Conf. (DRC), Santa Barbara, CA, USA, 2011, pp. 199-200.
-
(2011)
Proc. 69th Annu. Device Res. Conf. (DRC)
, pp. 199-200
-
-
Agarwal, S.1
Yablonovitch, E.2
-
7
-
-
84928614108
-
Observation of long-lived interlayer excitons in monolayer MoSe2-WSe2 heterostructures
-
P. Rivera et al., "Observation of long-lived interlayer excitons in monolayer MoSe2-WSe2 heterostructures," Nat. Commun., 2014. [Online]. Available: http://arxiv. org/abs/1403. 4985
-
(2014)
Nat. Commun.
-
-
Rivera, P.1
-
8
-
-
84926231488
-
Ultrafast charge transfer in atomically thin MoS2/WS2 heterostructures
-
X. Hong et al., "Ultrafast charge transfer in atomically thin MoS2/WS2 heterostructures," Nat. Nanotechnol., vol. 9, no. 9, pp. 682-686, 2014. Available: http://dx. doi. org/10. 1038/nnano. 2014. 167
-
(2014)
Nat. Nanotechnol.
, vol.9
, Issue.9
, pp. 682-686
-
-
Hong, X.1
-
9
-
-
84898948331
-
Single particle transport in two-dimensional heterojunction interlayer tunneling field effect transistor
-
M. Li, D. Esseni, G. Snider, D. Jena, and H. G. Xing, "Single particle transport in two-dimensional heterojunction interlayer tunneling field effect transistor," J. Appl. Phys., vol. 115, no. 7, 2014, Art. ID 074508.
-
(2014)
J. Appl. Phys.
, vol.115
, Issue.7
-
-
Li, M.1
Esseni, D.2
Snider, G.3
Jena, D.4
Xing, H.G.5
-
10
-
-
84932184489
-
-
New York, NY, USA: Cambridge Univ. Press
-
D. Esseni, P. Palestri, and L. Selmi, Nanoscale MOS Transistors: Semi-Classical Transport and Applications. New York, NY, USA: Cambridge Univ. Press, 2011.
-
(2011)
Nanoscale MOS Transistors: Semi-Classical Transport and Applications
-
-
Esseni, D.1
Palestri, P.2
Selmi, L.3
-
11
-
-
33744572650
-
Tunnelling from a many-particle point of view
-
Jan.
-
J. Bardeen, "Tunnelling from a many-particle point of view," Phys. Rev. Lett., vol. 6, pp. 57-59, Jan. 1961.
-
(1961)
Phys. Rev. Lett.
, vol.6
, pp. 57-59
-
-
Bardeen, J.1
-
12
-
-
84857870146
-
Single-particle tunneling in doped graphene-insulator-graphene junctions
-
R. M. Feenstra, D. Jena, and G. Gu, "Single-particle tunneling in doped graphene-insulator-graphene junctions," J. Appl. Phys., vol. 111, no. 4, 2012, Art. ID 043711.
-
(2012)
J. Appl. Phys.
, vol.111
, Issue.4
-
-
Feenstra, R.M.1
Jena, D.2
Gu, G.3
-
13
-
-
84877747763
-
Resonant tunnelling and negative differential conductance in graphene transistors
-
Apr.
-
L. Britnell et al., "Resonant tunnelling and negative differential conductance in graphene transistors," Nat. Commun., vol. 4, Apr. 2013, Art. ID 1794.
-
(2013)
Nat. Commun.
, vol.4
-
-
Britnell, L.1
-
14
-
-
84906535026
-
Lateral transport in two-dimensional heterojunction interlayer tunneling field effect transistor (Thin-TFET)
-
Santa Barbara, CA, USA
-
M. O. Li, D. Esseni, D. Jena, and H. G. Xing, "Lateral transport in two-dimensional heterojunction interlayer tunneling field effect transistor (Thin-TFET)," in Proc. 72nd Annu. Device Res. Conf. (DRC), Santa Barbara, CA, USA, 2014, pp. 17-18.
-
(2014)
Proc. 72nd Annu. Device Res. Conf. (DRC)
, pp. 17-18
-
-
Li, M.O.1
Esseni, D.2
Jena, D.3
Xing, H.G.4
-
15
-
-
0032607882
-
Band lineup of a SnS2/SnSe2/SnS2 semiconductor quantum well structure prepared by van der Waals epitaxy
-
R. Schlaf, C. Pettenkofer, and W. Jaegermann, "Band lineup of a SnS2/SnSe2/SnS2 semiconductor quantum well structure prepared by van der Waals epitaxy," J. Appl. Phys., vol. 85, no. 9, pp. 6550-6556, 1999.
-
(1999)
J. Appl. Phys.
, vol.85
, Issue.9
, pp. 6550-6556
-
-
Schlaf, R.1
Pettenkofer, C.2
Jaegermann, W.3
-
16
-
-
0033092772
-
Band lineup of layered semiconductor heterointerfaces prepared by van der Waals epitaxy: Charge transfer correction term for the electron affinity rule
-
R. Schlaf, O. Lang, C. Pettenkofer, and W. Jaegermann, "Band lineup of layered semiconductor heterointerfaces prepared by van der Waals epitaxy: Charge transfer correction term for the electron affinity rule," J. Appl. Phys., vol. 85, no. 5, pp. 2732-2753, 1999.
-
(1999)
J. Appl. Phys.
, vol.85
, Issue.5
, pp. 2732-2753
-
-
Schlaf, R.1
Lang, O.2
Pettenkofer, C.3
Jaegermann, W.4
-
17
-
-
0039663627
-
Semiconducting properties of single crystals of n-and p-type tungsten diselenide (WSe2)
-
L. Upadhyayula, J. Loferski, A. Wold, W. Giriat, and R. Kershaw, "Semiconducting properties of single crystals of n-and p-type tungsten diselenide (WSe2)," J. Appl. Phys., vol. 39, no. 10, pp. 4736-4740, 1968.
-
(1968)
J. Appl. Phys.
, vol.39
, Issue.10
, pp. 4736-4740
-
-
Upadhyayula, L.1
Loferski, J.2
Wold, A.3
Giriat, W.4
Kershaw, R.5
-
18
-
-
84919477409
-
Theory of graphene-insulator-graphene tunnel junctions
-
C. Sergio, Q. Gao, and R. M. Feenstra, "Theory of graphene-insulator-graphene tunnel junctions," J. Vac. Sci. Technol. B, vol. 32, no. 4, 2014, Art. ID 04E101.
-
(2014)
J. Vac. Sci. Technol. B
, vol.32
, Issue.4
-
-
Sergio, C.1
Gao, Q.2
Feenstra, R.M.3
-
19
-
-
84908541914
-
Operating principles of vertical transistors based on monolayer two-dimensional semiconductor heterojunctions
-
K. T. Lam, G. Seol, and J. Guo, "Operating principles of vertical transistors based on monolayer two-dimensional semiconductor heterojunctions," Appl. Phys. Lett., vol. 105, no. 1, 2014, Art. ID 013112.
-
(2014)
Appl. Phys. Lett.
, vol.105
, Issue.1
-
-
Lam, K.T.1
Seol, G.2
Guo, J.3
-
20
-
-
84867896172
-
Understanding the superlinear onset of tunnel-FET output characteristic
-
Nov.
-
L. De Michielis, L. Lattanzio, and A.-M. Ionescu, "Understanding the superlinear onset of tunnel-FET output characteristic," IEEE Electron Device Lett., vol. 33, no. 11, pp. 1523-1525, Nov. 2012.
-
(2012)
IEEE Electron Device Lett.
, vol.33
, Issue.11
, pp. 1523-1525
-
-
De Michielis, L.1
Lattanzio, L.2
Ionescu, A.-M.3
-
21
-
-
0036923438
-
FinFET scaling to 10 nm gate length
-
San Francisco, CA, USA
-
B. Yu et al., "FinFET scaling to 10 nm gate length," in Proc. Int. Electron Devices Meeting (IEDM), San Francisco, CA, USA, 2002, pp. 251-254.
-
(2002)
Proc. Int. Electron Devices Meeting (IEDM)
, pp. 251-254
-
-
Yu, B.1
-
22
-
-
84903954393
-
Tailoring the electronic structure in bilayer molybdenum disulfide via interlayer twist
-
A. M. van der Zande et al., "Tailoring the electronic structure in bilayer molybdenum disulfide via interlayer twist," Nano lett., vol. 14, no. 7, pp. 3869-3875, 2014.
-
(2014)
Nano Lett.
, vol.14
, Issue.7
, pp. 3869-3875
-
-
Zande Der Van, A.M.1
-
23
-
-
83655192487
-
Ripples and layers in ultrathin MoS2 membranes
-
J. Brivio, D. T. L. Alexander, and A. Kis, "Ripples and layers in ultrathin MoS2 membranes," Nano Lett., vol. 11, no. 12, pp. 5148-5153, 2011. [Online]. Available: http://dx. doi. org/10. 1021/nl2022288
-
(2011)
Nano Lett.
, vol.11
, Issue.12
, pp. 5148-5153
-
-
Brivio, J.1
Alexander, D.T.L.2
Kis, A.3
-
25
-
-
84926042922
-
2D crystal semiconductors: Intimate contacts
-
Dec.
-
D. Jena, K. Banerjee, and G. H. Xing, "2D crystal semiconductors: Intimate contacts," Nat. Mater., vol. 13, no. 12, pp. 1076-1078, Dec. 2014. [Online]. Available: http://dx. doi. org/10. 1038/nmat4121
-
(2014)
Nat. Mater.
, vol.13
, Issue.12
, pp. 1076-1078
-
-
Jena, D.1
Banerjee, K.2
Xing, G.H.3
-
26
-
-
78649987428
-
Device and architecture outlook for beyond CMOS switches
-
Dec.
-
K. Bernstein, R. Cavin, W. Porod, A. Seabaugh, and J. Welser, "Device and architecture outlook for beyond CMOS switches," Proc. IEEE, vol. 98, no. 12, pp. 2169-2184, Dec. 2010.
-
(2010)
Proc. IEEE
, vol.98
, Issue.12
, pp. 2169-2184
-
-
Bernstein, K.1
Cavin, R.2
Porod, W.3
Seabaugh, A.4
Welser, J.5
-
27
-
-
84876100812
-
Uniform methodology for benchmarking beyond-CMOS logic devices
-
San Francisco, CA, USA
-
D. Nikonov and I. Young, "Uniform methodology for benchmarking beyond-CMOS logic devices," in Proc. Int. Electron Devices Meeting (IEDM), San Francisco, CA, USA, 2012, pp. 25. 4. 1-25. 4. 4.
-
(2012)
Proc. Int. Electron Devices Meeting (IEDM)
, pp. 2541-2544
-
-
Nikonov, D.1
Young, I.2
-
28
-
-
84889633757
-
Overview of beyond-CMOS devices and a uniform methodology for their benchmarking
-
Dec.
-
D. Nikonov and I. Young, "Overview of beyond-CMOS devices and a uniform methodology for their benchmarking," Proc. IEEE, vol. 101, no. 12, pp. 2498-2533, Dec. 2013.
-
(2013)
Proc. IEEE
, vol.101
, Issue.12
, pp. 2498-2533
-
-
Nikonov, D.1
Young, I.2
-
29
-
-
84928644984
-
-
The Center for Low Energy Systems Technology (LEAST) Proposal, University of Notre Dame, submitted to Semiconductor Research Corporation (SRC) 2012
-
The Center for Low Energy Systems Technology (LEAST) Proposal, University of Notre Dame, submitted to Semiconductor Research Corporation (SRC), 2012.
-
-
-
-
30
-
-
84906544258
-
Vertical heterojunction of MoS2 and WSe2
-
Santa Barbara, CA, USA
-
S. Xiao, M. Li, A. Seabaugh, D. Jena, and H. Xing, "Vertical heterojunction of MoS2 and WSe2," in Proc. 72nd Annu. Device Res. Conf. (DRC), Santa Barbara, CA, USA, 2014, pp. 169-170.
-
(2014)
Proc. 72nd Annu. Device Res. Conf. (DRC)
, pp. 169-170
-
-
Xiao, S.1
Li, M.2
Seabaugh, A.3
Jena, D.4
Xing, H.5
-
31
-
-
84928606604
-
Molecular beam epitaxy of layered material superlattices and heterostructures
-
Mar.
-
S. Vishwanath et al., "Molecular beam epitaxy of layered material superlattices and heterostructures," Bull. Amer. Phys. Soc., vol. 59, no. 1, Mar. 2014.
-
(2014)
Bull. Amer. Phys. Soc.
, vol.59
, Issue.1
-
-
Vishwanath, S.1
-
32
-
-
84906243387
-
Atomic layer deposition of a high-k dielectric on MoS2 using trimethylaluminum and ozone
-
L. Cheng et al., "Atomic layer deposition of a high-k dielectric on MoS2 using trimethylaluminum and ozone," ACS Appl. Mater. Interf., vol. 6, no. 15, pp. 11834-11838, 2014.
-
(2014)
ACS Appl. Mater. Interf.
, vol.6
, Issue.15
, pp. 11834-11838
-
-
Cheng, L.1
-
33
-
-
84903437984
-
Field-effect transistors built from all two-dimensional material components
-
T. Roy et al., "Field-effect transistors built from all two-dimensional material components," ACS Nano, vol. 6, no. 8, pp. 6259-6264, 2014.
-
(2014)
ACS Nano
, vol.6
, Issue.8
, pp. 6259-6264
-
-
Roy, T.1
-
34
-
-
84863855836
-
High-performance single layered WSe2 p-FETs with chemically doped contacts
-
H. Fang et al., "High-performance single layered WSe2 p-FETs with chemically doped contacts," Nano Lett., vol. 12, no. 7, pp. 3788-3792, 2012.
-
(2012)
Nano Lett.
, vol.12
, Issue.7
, pp. 3788-3792
-
-
Fang, H.1
-
35
-
-
84907689916
-
High-performance MoS2 field-effect transistors enabled by chloride doping: Record low contact resistance (0. 5 k ?m) and record high drain current (460 A/m)
-
Honolulu, HI, USA
-
L. Yang et al., "High-performance MoS2 field-effect transistors enabled by chloride doping: Record low contact resistance (0. 5 k ?m) and record high drain current (460 A/m)," in Proc. Symp. VLSI Technol. Dig. Tech. Papers, Honolulu, HI, USA, 2014, pp. 1-2.
-
(2014)
Proc. Symp. VLSI Technol. Dig. Tech. Papers
, pp. 1-2
-
-
Yang, L.1
-
36
-
-
84928614512
-
Reconfigurable ion doping in 2H-Mote2 field-effect transistors using PEO: CsClO4 electrolyte
-
Montpellier, France
-
H. Xu, E. Kinder, S. Fathipour, A. Seabaugh, and S. Fullerton-Shirey, "Reconfigurable ion doping in 2H-Mote2 field-effect transistors using PEO: CsClO4 electrolyte," in Proc. 41st Int. Symp. Compd. Semicond. (ISCS), Montpellier, France, 2014.
-
(2014)
Proc. 41st Int. Symp. Compd. Semicond. (ISCS)
-
-
Xu, H.1
Kinder, E.2
Fathipour, S.3
Seabaugh, A.4
Fullerton-Shirey, S.5
-
37
-
-
85027951220
-
Phase-engineered low-resistance contacts for ultrathin MoS2 transistors
-
R. Kappera et al., "Phase-engineered low-resistance contacts for ultrathin MoS2 transistors," Nat. Mater., vol. 13, no. 12, pp. 1128-1134, 2014. [Online]. Available: http://dx. doi. org/10. 1038/nmat4080
-
(2014)
Nat. Mater.
, vol.13
, Issue.12
, pp. 1128-1134
-
-
Kappera, R.1
|