Determination of the internal morphology of nanostructures patterned by directed self assembly

ACS Nano

Volumn 8, Issue 8, 2014, Pages 8426-8437

  Sunday, Daniel F ^a   Hammond, Matthew R ^a   Wang, Chengqing ^a   Wu, Wen Li ^a   Delongchamp, Dean M ^a   Tjio, Melia ^b   Cheng, Joy Y ^b   Pitera, Jed W ^b   Kline, R Joseph ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

block copolymer; directed self assembly; resonant scattering; soft X ray

Indexed keywords

BLOCK COPOLYMERS; MORPHOLOGY; SELF ASSEMBLY; X RAY SCATTERING;

CONVENTIONAL LITHOGRAPHY; DIRECTED SELF-ASSEMBLY; EXPERIMENTAL CONFIRMATION; MEASUREMENT TECHNIQUES; RESOLUTION ENHANCEMENT; RESONANT SCATTERING; SOFT X-RAY; X-RAY SCATTERING MEASUREMENTS;

X RAYS;

EID: 84906658468     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn5029289     Document Type: Article

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