Three-dimensional x-ray metrology for block copolymer lithography line-space patterns

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 12, Issue 3, 2013, Pages

  Sunday, Daniel F ^a   Hammond, Matthew R ^a   Wang, Chengqing ^a   Wu, Wen Li ^a   Kline, R Joseph ^a   Stein, Gila E ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b UNIVERSITY OF HOUSTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRICAL ENGINEERING; MECHANICAL ENGINEERING;

BLOCK COPOLYMER LITHOGRAPHY; BURIED STRUCTURE; DIRECTED SELF-ASSEMBLY; NEW MEASUREMENT METHOD; RESONANT SCATTERING; SMALL ANGLE X-RAY SCATTERING; THREE-DIMENSIONAL SHAPE; X-RAY METROLOGY;

BLOCK COPOLYMERS;

EID: 84892723069     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.JMM.12.3.031103     Document Type: Article

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