Conversion of bilayers of PS-b-PDMS block copolymer into closely packed, aligned silica nanopatterns

ACS Nano

Volumn 7, Issue 6, 2013, Pages 5595-5606

  Wu, Nathanael L Y ^a,b   Harris, Kenneth D ^a   Buriak, Jillian M ^a,b  

^a NATIONAL RESEARCH COUNCIL CANADA   (Canada)

^b UNIVERSITY OF ALBERTA   (Canada)

Author keywords

block copolymer; brush layer; graphoepitaxy; homopolymer blends; patterning; plasma; PS b PDMS; self assembly; solvent annealing

Indexed keywords

BRUSH LAYERS; GRAPHOEPITAXY; HOMOPOLYMER BLENDS; PATTERNING; SOLVENT ANNEALING;

BLENDING; BLOCK COPOLYMERS; BRUSHES; MICROCHANNELS; MONOLAYERS; PLASMAS; SELF ASSEMBLY; SILICA;

SILICONES;

EID: 84879628870     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn401968t     Document Type: Article

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