Small angle x-ray scattering metrology for sidewall angle and cross section of nanometer scale line gratings

Journal of Applied Physics

Volumn 96, Issue 4, 2004, Pages 1983-1987

  Hu, Tengjiao ^a   Jones, Ronald L ^a   Wu, Wen Li ^a   Lin, Eric K ^a   Lin, Qinghuang ^b   Keane, Denis ^c   Weigand, Steve ^c   Quintana, John ^c  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

^c ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LINE EDGE ROUGHNESS (LER); PATTERN SHAPE PROFILES; SIDEWALL ANGLE; SMALL ANGLE X-RAY SCATTERING (SAXS);

APPROXIMATION THEORY; ASPECT RATIO; ATOMIC FORCE MICROSCOPY; COMPUTER SIMULATION; DIFFRACTION GRATINGS; EXTRAPOLATION; LIGHT INTERFERENCE; NONDESTRUCTIVE EXAMINATION; PHOTORESISTS; RANDOM PROCESSES; ROTATION; SAMPLING; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTALS; X RAY SCATTERING;

NANOSTRUCTURED MATERIALS;

EID: 4344676391     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1773376     Document Type: Article

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