Characterization of correlated line edge roughness of nanoscale line gratings using small angle x-ray scattering

Journal of Applied Physics

Volumn 102, Issue 2, 2007, Pages

  Wang, Chengqingx ^a   Jones, Ronald L ^a   Lin, Eric K ^a   Wu, Wen Li ^a   Rice, Bryan J ^b   Choi, Kwang Woo ^b   Thompson, George ^b   Weigand, Steven J ^c   Keane, Denis T ^c  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b INTEL CORPORATION   (United States)

^c ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEBYE WALLER FACTOR; LENGTH SCALES; LINEWIDTH ROUGHNESS (LWR); NONDESTRUCTIVE METHOD;

LINEWIDTH; MEASUREMENTS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICES; SURFACE ROUGHNESS; X RAY SCATTERING;

DIFFRACTION GRATINGS;

EID: 34547600819     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2753588     Document Type: Article

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