SCOPUS 정보 검색 플랫폼

Volumn 29, Issue 6, 2011, Pages

Etch properties of resists modified by sequential infiltration synthesis

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM OXIDE; ESTERS;

ETCH PROPERTIES; ETCH RESISTANCE; HARD MASKS; LINE EDGE ROUGHNESS; PATTERN FIDELITY; POLY(METHYL METHACRYLATE) (PMMA); PROCESS COSTS; RESIST FILMS;

ELECTRON BEAM LITHOGRAPHY;

EID: 84255183804 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3640758 Document Type: Article

Times cited : (63)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.