Investigation of atmospheric-pressure plasma deposited hexafluorobenzene fluorocarbon film

Surface and Coatings Technology

Volumn 259, Issue PB, 2014, Pages 290-296

  Ma, Wei Chun ^a   Tsai, Ching Yuan ^a   Huang, Chun ^a  

^a YUAN ZE UNIVERSITY   (Taiwan)

Author keywords

Atmospheric pressure plasma; Deposition; Fluorocarbon films; Hexafluorobenzene; Plasma jet; Surface analysis

Indexed keywords

ARGON; ATMOSPHERIC CHEMISTRY; ATMOSPHERIC MOVEMENTS; ATMOSPHERIC PRESSURE; CARBON; CARBON FILMS; DEPOSITION; FLOW OF GASES; FLOW RATE; FLUORINE; FLUOROCARBONS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LUNAR SURFACE ANALYSIS; MONOMERS; PLASMA JETS; SCANNING ELECTRON MICROSCOPY; SURFACE ANALYSIS; SURFACE PROPERTIES; TEMPERATURE;

ATMOSPHERIC PRESSURE PLASMA JETS; ATMOSPHERIC PRESSURE PLASMAS; DEPOSITION PROCESS; FLUOROCARBON FILMS; HEXAFLUOROBENZENE; LOW TEMPERATURES; SCANNING ELECTRONS; THIN-FILM DEPOSITIONS;

CHEMICAL ANALYSIS;

EID: 84923513852     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2014.01.059     Document Type: Article

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