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Plasmas and Polymers

Volumn 5, Issue 3-4, 2000, Pages 173-190

Thin films deposition from hexamethyldisiloxane and hexamethyldisilazane under Dielectric-Barrier Discharge (DBD) conditions

(6) Schmidt Szalowski, K a Rzanek Boroch Z a Sentek, J a Rymuza, Z a Kusznierewicz, Z a Misiak, M a

a WARSAW UNIVERSITY OF TECHNOLOGY (Poland)

Author keywords

Filamentary discharge; HMDSN; HMDSO; PE CVD; SiO2; TEOS

Indexed keywords

DEPOSITION; DIELECTRIC PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS;

DIELECTRIC-BARRIER DISCHARGE (DBD) CONDITIONS;

SILICON COMPOUNDS;

EID: 0034435659 PISSN: 10840184 EISSN: None Source Type: Journal
DOI: 10.1023/A:1011314420080 Document Type: Article

Times cited : (88)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.