SCOPUS 정보 검색 플랫폼

Plasma Processes and Polymers

Volumn 6, Issue 9, 2009, Pages 547-554

Optical emission spectroscopy of argon-fluorocarbon-oxygen fed atmospheric pressure dielectric barrier discharges

(1) Fanelli, Fiorenza a

a UNIVERSITY OF BARI (Italy)

Author keywords

Atmospheric pressure; Density; Excimers; Fluorocarbons; Optical emission spectroscopy (OES); Transitions

Indexed keywords

AR ATOM; ATMOSPHERIC PRESSURE DIELECTRIC BARRIER DISCHARGES; DENSITY; EXCIMERS; EXPERIMENTAL CONDITIONS; FEED GAS; FILAMENTARY DIELECTRIC BARRIER DISCHARGES; NARROW SIGNALS; PROCESS-DRIVEN; SILICON SUBSTRATES; UV-VIS SPECTRA;

ARGON; ATMOSPHERIC PRESSURE; ATMOSPHERICS; ATOMIC SPECTROSCOPY; ATOMS; DIELECTRIC DEVICES; ELECTRIC DISCHARGES; EMISSION SPECTROSCOPY; FLUOROCARBONS; GAS EMISSIONS; LEAKAGE (FLUID); LIGHT EMISSION; OXYGEN; PHOTORESISTS; PLASMA ETCHING; PLASMAS;

OPTICAL EMISSION SPECTROSCOPY;

EID: 70450218711 PISSN: 16128850 EISSN: 16128869 Source Type: Journal
DOI: 10.1002/ppap.200950012 Document Type: Article

Times cited : (16)

References (67)

1
- 0002040103
- R. d'Agostino, Ed., Academic Press, New York
- R. d'Agostino, F. Cramarossa, F. Fracassi, F. Illuzzi, Plasma Deposition, Treatment and Etching of Polymers, R. d'Agostino, Ed., Academic Press, New York 1990, p. 95.
- (1990) Plasma Deposition, Treatment and Etching of Polymers , pp. 95
- D'Agostino, R.¹ Cramarossa, F.² Fracassi, F.³ Illuzzi, F.⁴

2
- 23044436124
- R. d'Agostino, P. Favia, F. Fracassi, Eds., Kluwer Academic Publishers, NATO ASI Series, E: Appl. Sci
- R. d'Agostino, Plasma Processing of Polymers, R. d'Agostino, P. Favia, F. Fracassi, Eds., Kluwer Academic Publishers, NATO ASI Series, E: Appl. Sci 1997, Vol.346, p. 3.
- (1997) Plasma Processing of Polymers , vol.346 , pp. 3
- D'Agostino, R.¹

3
- 70450220702
- W. Weed, Ed., AVS Press New York
- G. S. Selwyn, AVS Monogr. Ser. M-11 W. Weed, Ed., AVS Press New York 1993.
- (1993) AVS Monogr. Ser. M-11
- Selwyn, G.S.¹

4
- 0019021889
- J. W. Coburn, M. Chen, J. Appl. Phys. 1980, 51, 3134.
- (1980) J. Appl. Phys. , vol.51 , pp. 3134
- Coburn, J.W.¹ Chen, M.²

5
- 0018986229
- J. W. Coburn, M. Chen, J. Vac. Sci. Technol. 1981, 18, 353.
- (1981) J. Vac. Sci. Technol. , vol.18 , pp. 353
- Coburn, J.W.¹ Chen, M.²

6
- 0019539448
- R. d'Agostino, F. Cramarossa, S. DeBenedictis, G. Ferraro, J. Appl. Phys. 1981, 52, 1259.
- (1981) J. Appl. Phys. , vol.52 , pp. 1259
- D'Agostino, R.¹ Cramarossa, F.² Debenedictis, S.³ Ferraro, G.⁴

7
- 0019730296
- R. d'Agostino, V. Colaprico, F. Cramarossa, Plasma Chem. Plasma Process. 1981, 1, 365.
- (1981) Plasma Chem. Plasma Process. , vol.1 , pp. 365
- D'Agostino, R.¹ Colaprico, V.² Cramarossa, F.³

8
- 0020176149
- R. d'Agostino, F. Cramarossa, S. DeBenedictis, Plasma Chem. Plasma Process. 1982, 2, 213.
- (1982) Plasma Chem. Plasma Process. , vol.2 , pp. 213
- D'Agostino, R.¹ Cramarossa, F.² Debenedictis, S.³

9
- 0025403847
- T. Yokoyama, M. Kogoma, S. Kanazawa, T. Moriwaki, S. Okazaki, J. Phys. D: Appl. Phys. 1990, 23(3), 374.
- (1990) J. Phys. D: Appl. Phys. , vol.23 , Issue.3 , pp. 374
- Yokoyama, T.¹ Kogoma, M.² Kanazawa, S.³ Moriwaki, T.⁴ Okazaki, S.⁵

10
- 0043082924
- R. d'Agostino, P. Favia, F. Fracassi, Eds., Kluwer Academic Publishers, NATO ASI Series, E: Appl. Sci
- M. Kogoma, R. Prat, T. Suwa, A. Takeda, S. Okazaki, T. Inomata, Plasma Processing of Polymers, R. d'Agostino, P. Favia, F. Fracassi, Eds., Kluwer Academic Publishers, NATO ASI Series, E: Appl. Sci 1997, Vol.346, p. 379.
- (1997) Plasma Processing of Polymers , vol.346 , pp. 379
- Kogoma, M.¹ Prat, R.² Suwa, T.³ Takeda, A.⁴ Okazaki, S.⁵ Inomata, T.⁶

11
- 23044445053
- H. Biederman, Ed., Imperial College Press, London
- M. Kogoma, Plasma Polymer Films, H. Biederman, Ed., Imperial College Press, London 2004.
- (2004) Plasma Polymer Films
- Kogoma, M.¹

12
- 70450217075
- I. P. Vinogradov, A. Dinkelmann, A. Lunk, Surf. Coat. Technol. 2003, 509, 174.
- (2003) Surf. Coat. Technol. , vol.509 , pp. 174
- Vinogradov, I.P.¹ Dinkelmann, A.² Lunk, A.³

13
- 9144238885
- I. P. Vinogradov, A Dinkelmann, A. Lunk, J. Phys. D: Appl. Phys. 2004, 37, 3000.
- (2004) J. Phys. D: Appl. Phys. , vol.37 , pp. 3000
- Vinogradov, I.P.¹ Dinkelmann, A.² Lunk, A.³

14
- 23044449159
- I. P. Vinogradov, A. Lunk, Plasma Process. Polym. 2005, 2, 201.
- (2005) Plasma Process. Polym. , vol.2 , pp. 201
- Vinogradov, I.P.¹ Lunk, A.²

15
- 70450211953
- F. Fanelli, R. d'Agostino, F. Fracassi, Plasma Process. Polym. 2007, 4, 795.
- (2007) Plasma Process. Polym. , vol.4 , pp. 795
- Fanelli, F.¹ D'Agostino, R.² Fracassi, F.³

16
- 36348961996
- F. Fanelli, F. Fracassi, R. d'Agostino, Plasma Process. Polym. 2007, 4, S430.
- (2007) Plasma Process. Polym. , vol.4
- Fanelli, F.¹ Fracassi, F.² D'Agostino, R.³

17
- 54149094326
- F. Fanelli, F. Fracassi, R. d'Agostino, Plasma Process. Polym. 2008, 5, 424.
- (2008) Plasma Process. Polym. , vol.5 , pp. 424
- Fanelli, F.¹ Fracassi, F.² D'Agostino, R.³

18
- 70450212666
- W. R. Harshbarger, R. A. Porter, P. Norton, J. Electron. Mater. 1979, 16, 391.
- (1979) J. Electron. Mater. , vol.16 , pp. 391
- Harshbarger, W.R.¹ Porter, R.A.² Norton, P.³

19
- 0000827476
- P. Venkateswarlu, Phys. Rev. 1950, 77, 676.
- (1950) Phys. Rev. , vol.77 , pp. 676
- Venkateswarlu, P.¹

20
- 70450220701
- Q.-T. Trung, G. Durocher, P. Sauvageau, C. Sandorfy, Chem. Phys. Lett. 1977, 47, 406.
- (1977) Chem. Phys. Lett. , vol.47 , pp. 406
- Trung, Q.-T.¹ Durocher, G.² Sauvageau, P.³ Sandorfy, C.⁴

21
- 84975365144
- M. M. Millard, E. Kay, J. Electrochem. Soc.: Solid-State Sci. Technol. 1982, 129, 160.
- (1982) J. Electrochem. Soc.: Solid-State Sci. Technol. , vol.129 , pp. 160
- Millard, M.M.¹ Kay, E.²

22
- 0001447476
- L. B. D. Kiss, J.-P. Nicolai, W. T. Conner, H. H. Sawin, J. Appl. Phys. 1992, 71, 3186.
- (1992) J. Appl. Phys. , vol.71 , pp. 3186
- Kiss, L.B.D.¹ Nicolai, J.-P.² Conner, W.T.³ Sawin, H.H.⁴

23
- 54149101145
- D. Flamm, J. Appl. Phys. 1980, 78, 11.
- (1980) J. Appl. Phys. , vol.78 , pp. 11
- Flamm, D.¹

24
- 0022076191
- G. S. Selwyn, E. Kay, Plasma Chem. Plasma Process. 1985, 5, 183.
- (1985) Plasma Chem. Plasma Process. , vol.5 , pp. 183
- Selwyn, G.S.¹ Kay, E.²

25
- 0020719528
- R. d'Agostino, F. Cramarossa, V. Colaprico, R. d'Ettole, J. Appl. Phys. 1983, 54, 1284.
- (1983) J. Appl. Phys. , vol.54 , pp. 1284
- D'Agostino, R.¹ Cramarossa, F.² Colaprico, V.³ D'Ettole, R.⁴

26
- 21544445961
- R. d'Agostino, F. Cramarossa, F. Illuzzi, J. Appl. Phys. 1987, 61, 2754.
- (1987) J. Appl. Phys. , vol.61 , pp. 2754
- D'Agostino, R.¹ Cramarossa, F.² Illuzzi, F.³

27
- 0004255148
- D. M. Manos, D. L Flamm, Eds., Academic Press, New York
- D. L. Flamm, Plasma Etching: An Introduction, D. M. Manos, D. L Flamm, Eds., Academic Press, New York 1989.
- (1989) Plasma Etching: An Introduction
- Flamm, D.L.¹

28
- 0344110122
- J. P. Booth, G. Hancock, Mater. Sci. Forum 1993, 140-142, 219.
- (1993) Mater. Sci. Forum , vol.140-142 , pp. 219
- Booth, J.P.¹ Hancock, G.²

29
- 0037098027
- B. A. Cruden, K. K. Gleason, H. H. Sawin, J. Appl. Phys. 2002, 91, 9547.
- (2002) J. Appl. Phys. , vol.91 , pp. 9547
- Cruden, B.A.¹ Gleason, K.K.² Sawin, H.H.³

30
- 0000246867
- I. C. Plumb, K. R. Ryan, Plasma Chem. Plasma Process. 1986, 6, 205.
- (1986) Plasma Chem. Plasma Process. , vol.6 , pp. 205
- Plumb, I.C.¹ Ryan, K.R.²

31
- 0037807941
- L.-M. Buchmann, F. Heinrich, P. Hoffmann, J. Janes, J. Appl. Phys. 1990, 67, 3635.
- (1990) J. Appl. Phys. , vol.67 , pp. 3635
- Buchmann, L.-M.¹ Heinrich, F.² Hoffmann, P.³ Janes, J.⁴

32
- 0003527573
- IFI/Plenum, New York, Washington
- A. R. Striganov, N. S. Sventiskii, Tables of Spectral Lines of Neutral and Ionized Atoms, IFI/Plenum, New York, Washington 1968.
- (1968) Tables of Spectral Lines of Neutral and Ionized Atoms
- Striganov, A.R.¹ Sventiskii, N.S.²

33
- 0003740740
- th edition, Chapman and Hall, London
- th edition, Chapman and Hall, London 1976.
- (1976) The Identification of Molecular Spectra
- Pearse, R.W.B.¹ Gaydon, A.G.²

34
- 0003867807
- nd Ed. Springer-Verlag, Berlin, Heidelberg
- nd Ed. Springer-Verlag, Berlin, Heidelberg 1984, Vol.30, p. 5.
- (1984) Topics in Applied Physics , vol.30 , pp. 5
- Krauss, M.¹ Mies, F.H.² Lasers, E.³

35
- 0011707128
- P. J. Hay, W. R. Wadt, T. H. Dunning, Ann. Rev. Phys. Chem. 1979, 30, 311.
- (1979) Ann. Rev. Phys. Chem. , vol.30 , pp. 311
- Hay, P.J.¹ Wadt, W.R.² Dunning, T.H.³

36
- 36049008165
- R. Herman, C. Weniger, L. Herman, Phys. Rev. 1951, 82, 751.
- (1951) Phys. Rev. , vol.82 , pp. 751
- Herman, R.¹ Weniger, C.² Herman, L.³

37
- 0002037815
- Excimer Lasers
- 2nd Ed., Ch. K. Rhodes, Ed., Springer-Verlag, Berlin Heidelberg
- Ch. Brau, "Excimer Lasers", in: Topics in Applied Physics, Vol.30, 2nd Ed., Ch. K. Rhodes, Ed., Springer-Verlag, Berlin Heidelberg 1984, p. 87.
- (1984) Topics in Applied Physics , vol.30 , pp. 87
- Brau, Ch.¹

38
- 0001760373
- C. A. Brau, J. J. Ewing, Appl. Phys. Lett. 1975, 27, 435.
- (1975) Appl. Phys. Lett. , vol.27 , pp. 435
- Brau, C.A.¹ Ewing, J.J.²

39
- 0001585778
- C. A. Brau, J. J. Ewing, J. Chem. Phys. 1975, 63, 4640.
- (1975) J. Chem. Phys. , vol.63 , pp. 4640
- Brau, C.A.¹ Ewing, J.J.²

40
- 0042580860
- M. Rokni, J. H. Jacob, J. A. Mangano, R. Brochu, Appl. Phys. Lett. 1977, 31, 79.
- (1977) Appl. Phys. Lett. , vol.31 , pp. 79
- Rokni, M.¹ Jacob, J.H.² Mangano, J.A.³ Brochu, R.⁴

41
- 84987063110
- H. H. Michelis, R. H. Hobbs, L. A. Wright, J. W. D. Connolly, Int. J. Quant. Chem. 1978, 13, 169.
- (1978) Int. J. Quant. Chem. , vol.13 , pp. 169
- Michelis, H.H.¹ Hobbs, R.H.² Wright, L.A.³ Connolly, J.W.D.⁴

42
- 0001714096
- C-H. Chen, J. P. Judish, M. G. Payne, J. Phys. B: At. Mol. Phys. 1978, 11, 2189.
- (1978) J. Phys. B: At. Mol. Phys. , vol.11 , pp. 2189
- Chen, C.-H.¹ Judish, J.P.² Payne, M.G.³

43
- 0018441076
- C.-H. Chen, M. G. Payne, IEEE J. Quantum Electron. 1979, QE15, 149.
- (1979) IEEE J. Quantum Electron. , vol.QE15 , pp. 149
- Chen, C.-H.¹ Payne, M.G.²

44
- 0037627523
- M. Salvermoser, D. E. Murnick, J. Appl. Phys. 2000, 88, 453.
- (2000) J. Appl. Phys. , vol.88 , pp. 453
- Salvermoser, M.¹ Murnick, D.E.²

45
- 70450220700
- N. G. Basov, V. A. Nanilychev, V. A. Dolgikh, O. M. Kerimov, V. S. Lebedev, A. G. Molchanov, J. Exp. Theor. Phys. Lett. 1977, 26, 16.
- (1977) J. Exp. Theor. Phys. Lett. , vol.26 , pp. 16
- Basov, N.G.¹ Nanilychev, V.A.² Dolgikh, V.A.³ Kerimov, O.M.⁴ Lebedev, V.S.⁵ Molchanov, A.G.⁶

46
- 36749106701
- W. R. Wadt, P. J. Hay, J. Chem. Phys. 1978, 68, 3850.
- (1978) J. Chem. Phys. , vol.68 , pp. 3850
- Wadt, W.R.¹ Hay, P.J.²

47
- 0041668528
- D. C. Lorents, D. H. Huestis, M. V. McCusker, H. H. Nakano, R. M. Hill, J. Chem. Phys. 1978, 68, 4657.
- (1978) J. Chem. Phys. , vol.68 , pp. 4657
- Lorents, D.C.¹ Huestis, D.H.² McCusker, M.V.³ Nakano, H.H.⁴ Hill, R.M.⁵

48
- 70450197917
- nd Ed. Springer-Verlag, Berlin, Heidelberg
- nd Ed. Springer-Verlag, Berlin, Heidelberg 1984, Vol.30, p. 181.
- (1984) Topics in Applied Physics , vol.30 , pp. 181
- Huestis, D.L.¹ Marowsky, G.² Tittel, F.K.³ Lasers, E.⁴

49
- 0000418114
- W. R. Wadt, P. J. Hay, Appl. Phys. Lett. 1977, 30, 573.
- (1977) Appl. Phys. Lett. , vol.30 , pp. 573
- Wadt, W.R.¹ Hay, P.J.²

50
- 0024065813
- B. Eliasson, U. Kogelschatz, Appl. Phys. B 1988, 46, 299.
- (1988) Appl. Phys. B , vol.46 , pp. 299
- Eliasson, B.¹ Kogelschatz, U.²

51
- 0025843301
- B. Geliert, U. Kogelschatz, Appl. Phys. B 1991, 52, 14.
- (1991) Appl. Phys. B , vol.52 , pp. 14
- Geliert, B.¹ Kogelschatz, U.²

52
- 70450215652
- Pisa (Italy)
- U. Kogelschatz, XX Int. Conf. Ionized Gases - Invited papers Pisa (Italy) 1991, p. 218.
- (1991) XX Int. Conf. Ionized Gases - Invited Papers , pp. 218
- Kogelschatz, U.¹

53
- 4243815836
- U. Kogelschatz, B. Eliasson, W. Egli, XXIII ICPIG Invited Papers, J. Phys. IV France 1997, 7, C4.
- (1997) XXIII ICPIG Invited Papers, J. Phys. IV France , vol.C4 , pp. 7
- Kogelschatz, U.¹ Eliasson, B.² Egli, W.³

54
- 0037285214
- U. Kogelschatz, Plasma Chem. Plasma Process. 2003, 23, 1.
- (2003) Plasma Chem. Plasma Process. , vol.23 , pp. 1
- Kogelschatz, U.¹

55
- 0020126717
- G. Marowsky, G. P. Glass, F. K. Tittel, K. Hohla, W. L. Wilsom, H. Weber, IEEE J. Quantum Electron. 1982, QE-18, 898.
- (1982) IEEE J. Quantum Electron. , vol.18 QE , pp. 898
- Marowsky, G.¹ Glass, G.P.² Tittel, F.K.³ Hohla, K.⁴ Wilsom, W.L.⁵ Weber, H.⁶

56
- 0000718549
- M. Ogawa, J. Chem. Phys. 1971, 54, 2550.
- (1971) J. Chem. Phys. , vol.54 , pp. 2550
- Ogawa, M.¹

57
- 0021588356
- M. W. P. Cann, J. B. Shin, R. W. Nicholls, Can. J. Phys. 1984, 62, 1738.
- (1984) Can. J. Phys. , vol.62 , pp. 1738
- Cann, M.W.P.¹ Shin, J.B.² Nicholls, R.W.³

58
- 0028480981
- M. Shimauchi, T. Miura, H. Takuma, Jpn. J. Appl. Phys. 1994, 33, 4628.
- (1994) Jpn. J. Appl. Phys. , vol.33 , pp. 4628
- Shimauchi, M.¹ Miura, T.² Takuma, H.³

59
- 0000429371
- T. Saito, S. Ito, Appl. Phys. B 1998, 66, 579.
- (1998) Appl. Phys. B , vol.66 , pp. 579
- Saito, T.¹ Ito, S.²

60
- 0000156528
- B. L G. Bakker, D. H. Parker, J. Chem. Phys. 2000, 112, 4037.
- (2000) J. Chem. Phys. , vol.112 , pp. 4037
- Bakker, B.L.G.¹ Parker, D.H.²

61
- 0005642664
- R. d'Agostino, P. Favia, F. Fracassi, Eds., Kluwer Academic Publishers, NATO ASI Series, E: Appl. Sci
- A. Hollander, J. Behenish, M. R. Wertheimer, Plasma Processing of Polymers, R. d'Agostino, P. Favia, F. Fracassi, Eds., Kluwer Academic Publishers, NATO ASI Series, E: Appl. Sci 1997, Vol.346, p. 411.
- (1997) Plasma Processing of Polymers , vol.346 , pp. 411
- Hollander, A.¹ Behenish, J.² Wertheimer, M.R.³

62
- 0001173514
- T. L. Porter, D. E. Mann, N. Acquista, J. Molec. Spectrosc. 1965, 16, 228.
- (1965) J. Molec. Spectrosc. , vol.16 , pp. 228
- Porter, T.L.¹ Mann, D.E.² Acquista, N.³

63
- 0002431982
- D. S. King, P. K. Schenck, J. C. Stephenson, J. Mol. Spectrosc. 1979, 78, 1.
- (1979) J. Mol. Spectrosc. , vol.78 , pp. 1
- King, D.S.¹ Schenck, P.K.² Stephenson, J.C.³

64
- 0039962656
- M. Suto, N. Washida, J. Chem. Phys. 1983, 78, 1007.
- (1983) J. Chem. Phys. , vol.78 , pp. 1007
- Suto, M.¹ Washida, N.²

65
- 0012332956
- C. R. Quick, J. J. Tiee, J. Preses, R. E. Weston, Appl. Phys. Lett. 1985, 114, 371.
- (1985) Appl. Phys. Lett. , vol.114 , pp. 371
- Quick, C.R.¹ Tiee, J.J.² Preses, J.³ Weston, R.E.⁴

66
- 0009439369
- C. Larrieu, M. Chaillet, A. Dargelos, J. Chem. Phys. 1992, 96, 3732.
- (1992) J. Chem. Phys. , vol.96 , pp. 3732
- Larrieu, C.¹ Chaillet, M.² Dargelos, A.³

67
- 0343979929
- A. Nagata, S. Takehuro, H. Sumi, M. Kogoma, S. Hokazaki, Y. Horiike, Proc. Jpn. Symp. Plasma Chem. 1989, Vol.2, p. 109.
- (1989) Proc. Jpn. Symp. Plasma Chem. , vol.2 , pp. 109
- Nagata, A.¹ Takehuro, S.² Sumi, H.³ Kogoma, M.⁴ Hokazaki, S.⁵ Horiike, Y.⁶

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.