Controlled fluorination of a-C:F:H films by PECVD of ethylene-hexafluorobenzene mixtures

Surface and Coatings Technology

Volumn 203, Issue 5-7, 2008, Pages 526-529

  Lopes, Bruno Bellotti ^a   Davanzo, Celso U ^b   Schreiner, Wido ^c   Durrant, Steven F ^a  

^a SÃO PAULO STATE UNIVERSITY UNESP   (Brazil)

^b UNIVERSITY OF CAMPINAS   (Brazil)

^c FEDERAL UNIVERSITY OF PARANÁ   (Brazil)

Author keywords

Hexafluorobenzene; IRRAS; PECVD; Thin films; XPS

Indexed keywords

ABS RESINS; ABSORPTION SPECTROSCOPY; ACIDS; ANGLE MEASUREMENT; CHEMICAL BONDS; CHEMICAL REACTIONS; CONTACT ANGLE; ETHYLENE; FLUORINATION; FLUORINE; FRICTION; HALOGENATION; INFRARED SPECTROSCOPY; LABORATORIES; MONOMERS; O RINGS; OXYGEN; PHOTOELECTRON SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA POLYMERIZATION; PLASMAS; POLYMERIZATION; POLYMERS; SURFACE CHEMISTRY; SURFACE TENSION; THICK FILMS;

ATOMIC RATIOS; DEPOSITION REACTIONS; DOUBLE BONDS; H FILMS; HEXAFLUOROBENZENE; INFRARED REFLECTION ABSORPTIONS; IRRAS; LOW FRICTION COEFFICIENTS; NORMAL INCIDENCES; PECVD; PHENYL RINGS; PLASMA POLYMERS; SPECTRAL DATUMS; SURFACE ENERGIES; TRIBOLOGICAL APPLICATIONS; X-RAY PHOTOELECTRON SPECTROSCOPIES; XPS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 56049110823     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.08.032     Document Type: Article

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