SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 529, Issue , 2013, Pages 292-295

The growth of organosilicon film using a hexamethyldisilazane/oxygen atmospheric pressure plasma jet

(4) Huang, Chun a Wu, Shin Yi a Tsai, Ching Yuan a Liu, Wei Ting a

a YUAN ZE UNIVERSITY (Taiwan)

Author keywords

Atmospheric pressure plasma jet; Chamberless deposition; Hexamethyldisilazane; Organosilicon thin film; Oxygen

Indexed keywords

ATMOSPHERIC PRESSURE PLASMA JETS; ATMOSPHERIC PRESSURE PLASMAS; CHEMICAL COMPOSITIONS; DEPOSITED FILMS; HEXAMETHYLDISILAZANE; HOMOGENEOUS THIN FILM; ORGANOSILICON FILMS; ORGANOSILICON THIN FILMS; OXYGEN FLOW RATES; OXYGEN GAS FLOW; OXYGEN MIXTURES; UV REGION; UV-VIS SPECTRA; UV-VIS SPECTROMETRY; VISIBLE REGION;

ABSORPTION SPECTROSCOPY; DEPOSITS; FILM GROWTH; FLOW RATE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; OXYGEN; PHOTOELECTRONS; PLASMA JETS; SURFACE ANALYSIS; TESTING; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

VAPOR DEPOSITION;

EID: 84873744619 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2012.05.055 Document Type: Conference Paper

Times cited : (18)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.