Ultrahigh-speed etching of organic films using microwave-excited nonequilibrium atmospheric-pressure plasma

Journal of Applied Physics

Volumn 98, Issue 4, 2005, Pages

  Yamakawa, Koji ^a   Hori, Masaru ^a   Goto, Toshio ^a   Den, Shoji ^b   Katagiri, Toshirou ^b   Kano, Hiroyuki ^c  

^a NAGOYA UNIVERSITY   (Japan)

^b Katagiri Engineering Co Ltd   (Japan)

^c NU EcoEngineering Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC-PRESSURE PLASMA SOURCE; CCD CAMERAS; ORGANIC FILMS; ULTRAHIGH-SPEED ETCHING;

CHARGE COUPLED DEVICES; ELECTRIC EXCITATION; ELECTRODES; ETCHING; HYDROGEN; MICROWAVES;

THIN FILMS;

EID: 25144495162     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2030409     Document Type: Article

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