Fluorination of polymers by means of He/CF4-Fed atmospheric pressure glow dielectric barrier discharges

Plasma Processes and Polymers

Volumn 5, Issue 5, 2008, Pages 424-432

  Fanelli, Fiorenza ^a   Fracassi, Francesco ^a   d'Agostino, Riccardo ^a  

^a UNIVERSITY OF BARI   (Italy)

Author keywords

Atmospheric pressure glow discharges (APGD); Dielectric barrier discharges (DBD); Fluorination; Optical emission spectroscopy (OES); Polymer treatment

Indexed keywords

ABS RESINS; ATMOSPHERIC PRESSURE; ATMOSPHERICS; ATOMIC SPECTROSCOPY; CHEMICAL REACTIONS; CLIMATOLOGY; CONCENTRATION (PROCESS); DIELECTRIC DEVICES; DISCHARGE (FLUID MECHANICS); ELECTRIC DISCHARGES; FLUORINATION; FLUORINE; GLOW DISCHARGES; HALOGENATION; HELIUM; INERT GASES; METEOROLOGY; MOLECULAR SPECTROSCOPY; OPTICAL EMISSION SPECTROSCOPY; PHOTORESISTS; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; PLASTIC PRODUCTS; POLYMERS; POSITRON EMISSION TOMOGRAPHY; PUMPING PLANTS;

ATMOSPHERIC PRESSURE GLOW DISCHARGES (APGD); ATMOSPHERIC PRESSURE GLOWS; DIELECTRIC BARRIER DISCHARGES (DBD); EXCITATION FREQUENCIES; GRAFTING; POLYMER TREATMENT; PROCESS PARAMETERS; SURFACE COMPOSITIONS; SURFACE FLUORINATIONS; TREATMENT DURATIONS;

EMISSION SPECTROSCOPY;

EID: 54149094326     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200800012     Document Type: Article

References (39)

1. M. Strobel, S. Corn, C. S. Lyons, G. A. Korba, J. Polym. Sci., Part A: Polym. Chem 1987, 25, 1295.
2. Y. Khairallah, F. Arefi, J. Amouroux, Thin Solid Films 1994, 241, 295.
3. F. Poincin-Epaillard, B. Pomepui, J.-C. Brosse, J. Polym. Sci. Part A: Polym. Chem. 1993, 31, 2671.
4. W. Wang, F. Poincin-Epaillard, J.-C. Brosse, D. Ausserre, Plasmas Polym. 1996, 1, 65.
5. C.-M. Chan, T.-M. Ko, H. Hiroaka, Surf. Sci. Rep. 1996, 24, 1.
6. J. Hopkins, J. P. S. Babyal, J. Phys. Chem. 1995, 99, 4261.
7. J. Hopkins, R. D. Boyd, J. P. S. Babyal, J. Phys. Chem. 1996, 100, 6755.
8. H. T. Sahin, S. Minolache, R. A. Young, F. Denes, Cellulose 2002, 9, 171.
9. C.-H. Wen, M.-J. Chuang, G.-H. Hsiue, Appl. Polym. Sci. 2006, 252, 3799.
10. R. d'Agostino, F. Cramarossa, S. De Benedictis, G. Ferraro, J. Appl. Phys. 1981, 52, 1259.
11. R. d'Agostino, F. Cramarossa, S. De Benedictis, Plasma Chem. Plasma Process. 1982, 2, 213.
12. R. d'Agostino, F. Cramarossa, F. Fracassi, F. Illuzzi, Plasma Deposition, Treatment and Etching of Polymers, R. d'Agostino, Ed., Academic Press, New York 1990, p. 25.
13. R. d'Agostino, in: Plasma Processing of Polymers, R. d'Agostino, P. Favia, F. Fracassi, Eds., Kluwer Academic Publishers, New York 1997.
14. S. Kanazawa, M. Kogoma, S. Okazaki, T. Moriwaki, Nucl. Instrum. Methods Phys. Res. 1989, R37/38, 842.
15. T. Yokoyama, M. Kogoma, S. Kanazawa, T. Moriwaki, S. Okazaki, J. Phys. D: Appl. Phys. 1990, 23, 1125.
16. I. P. Vinogradov, A. Dinkelmann, A. Lunk, Surf. Coat. Technol. 2003, 174-175, 509.
17. I. P. Vinogradov, A. Dinkelmann, A. Lunk, J. Phys. D: Appl. Phys. 2004, 37, 3000.
18. I. P. Vinogradov, A. Lunk, Plasma Process. Polym. 2005, 2, 201.
19. F. Fanelli, F. Fracassi, R. d'Agostino, Plasma Process. Polym. 2005, 2, 688.
20. F. Fanelli, R. d'Agostino, F. Fracassi, Plasma Process. Polym. 2007, 4, 797.
21. G. Beamson, D. Briggs, "High Resolution XPS of Organic Polymers", J. Wiley & Sons, Chichester 1992.
22. F. Massines, G. Gouda, J. Phys D.: Appl. Phys. 1998, 31, 3411.
23. I. Fleming, "Frontier Orbitals and Organic Chemical Reactions", Wiley Interscience, New York 1976.
24. H. Fukaya, T. Ono, T. Abe, J. Phys. Chem. A 2001, 105, 7401.
25. A. R. Striganov, N. S. Sventiskii, "Tables of Spectral Lines of Neutral and Ionized Atoms", IFI/Plenum, New York-Washington 1968.
26. R. W. B. Pearse, A. G. Gaydon, "The Identification of Molecular Spectra", 4th edition, Chapman and Hall, London 1976.
27. D. S. King, P. K. Schenck, J. C. Stephenson, J. Mol. Spectrosc. 1979, 78, 1.
28. J. Bretagne, F. Epaillard, A. Ricard, J. Polym. Sci. A: Polym. Chem. 1992, 30, 323.
29. P. Venkateswarlu, Phys. Rev. 1950, 77, 676.
30. D. Flamm, J. Appl. Phys. 1980, 78, 11.
31. M. Suto, N. Washida, J. Chem. Phys. 1983, 78, 1007.
32. M. Suto, N. Washida, J. Chem. Phys. 1983, 78, 1012.
33. M. Suto, N. Washida, H. Akimoto, M. Nakamura, J. Chem. Phys. 1983, 78, 1019.
34. C. Larrieu, M. Chaillet, A. Dargelos, J. Chem. Phys. 1992, 96, 5.
35. F. M. Aarts, Chem. Phys. Lett. 1985, 114, 114.
36. J. F. M. Aarts, S. M. Mason, R. P. Tuckett, Mol. Phys. 1987, 60, 761.
37. I. R. Lambert, S. M. Mason, R. P. Tuckett, J. Chem. Phys. 1988, 89, 2683.
38. H. A. Van Sprang, H. H. Borgersma, F. J. De Heer, Chem. Phys. 1978, 35, 51.
39. U. Muller, T. Bubel, G. Schulz, A. Sevilla, Z. Phys. D: At., Mol. Clusters 1992, 24, 131.