Plasma polymerization of fluorocarbon thin films on high temperature substrate and its application to low-k films

Thin Solid Films

Volumn 515, Issue 9, 2007, Pages 4111-4115

  Shirafuji, Tatsuru ^a   Nishimura, Yoshiyasu ^a   Tachibana, Kunihide ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

C6F6; In situ FTIR; Low k; Plasma polymerization; Thermal stability

Indexed keywords

AMORPHOUS FILMS; BENZENE; DEPOSITION; FLUOROCARBONS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HIGH TEMPERATURE EFFECTS; MONOMERS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA POLYMERIZATION; THERMODYNAMIC STABILITY;

AMORPHOUS FLUORINATED CARBON FILMS; BENZENE RINGS; INFRARED ABSORPTION SPECTRA;

THIN FILMS;

EID: 33847035214     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.02.051     Document Type: Article

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