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Journal of Applied Physics

Volumn 79, Issue 9, 1996, Pages 7227-7233

Characterization of a-C:H:N deposition from CH4/N2 rf plasmas using optical emission spectroscopy

(4) Clay, K J a Speakman, S P a Amaratunga, G A J a,b Silva, S R P a,c

a UNIVERSITY OF CAMBRIDGE (United Kingdom)

b UNIVERSITY OF LIVERPOOL (United Kingdom)

c UNIVERSITY OF SURREY (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001536204 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.361439 Document Type: Article

Times cited : (157)

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