Plasma polymerization behavior of fluorocarbon monomers in low-pressure AF and RF discharges

Plasma Processes and Polymers

Volumn 4, Issue 2, 2007, Pages 165-172

  Gilliam, Mary A ^a   Yu, Qingsong ^a   Yasuda, Hirotsugu ^a  

^a University of Missouri   (United States)

Author keywords

Dissociation glow; Fluorocarbons; Hydrocarbons; Plasma deposition; Plasma polymerization

Indexed keywords

DEPOSITION RATES; DISSOCIATION; HYDROCARBONS; MONOMERS; PLASMA DEPOSITION; PLASMA POLYMERIZATION;

FLUOROCARBON MONOMERS; LUMINOUS GAS PHASE;

FLUOROCARBONS;

EID: 33947192140     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200600076     Document Type: Article

References (27)

1. H. Yasuda, "Plasma Polymerization", Academic Press, Orlando 1985.
2. N. Morosoff, "An introduction to plasma polymerization" in: Plasma Deposition, Treatment, and Etching of Polymers, R. d'Agostino, Ed., Academic Pres, San Diego 1990, p. 1.
3. R. d'Agostino, F. Cramarossa, F. Fracassi, "Plasma polymerization of Fluorocarbons" in: Plasma Deposition, Treatment, and Etching of Polymers, R. d'Agostino, Ed., Academic Press, San Diego 1990, p. 95.
4. H. Yasuda, "Luminous Chemical Vapor Deposition and Interface Engineering", Marcel Dekker, New York 2005.
5. H. Yasuda, T. Hirotsu, J. Polym. Sci., Polym. Chem. Ed. 1978, 16, 743.
6. M. Miyama, H. K. Yasuda, J. Appl. Polym. Sci. 1998, 70, 237.
7. H. Yasuda, C. R. Wang, J. Polym. Sci., Polym. Chem. Ed. 1985, 23, 87.
8. K. H. Becker, "Fundamental electron collision processes relevant to low-temperature plasmas" in: AIP Conf. Proc., Phenomena in Ionized Gases, K. H. Becker, W. E. Carr, E. E. Kunhardt, Eds., AIP Press, New York 1996, p. 75.
9. R. Basner, M. Schmidt, H. Deutsch, V. Tarnovsky, A. Levin, A. K. Becker, J. Chem. Phys. 1995, 103, 211.
10. M. Deutsch, T. D. Mark, V. Tarnovsky, K. Becker, C. Cornelissen, L. Cespiva, V. Bonacic-Koutecky, Int. J. Mass Spetrom. Ion Proc. 1994, 137, 77.
11. K. Becker, "Electron Collisions with Molecules, Clusters, and Surfaces", H. Ehrhardt, L. A. Morgan, Eds. Plenum Press, New York 1994, p. 127.
12. P. Kurunczi, A. Koharian, K. Becker, K. E. Martus, Contrib. Plasma Phys. 1996, 36, 723.
13. Q. Yu, J. Deffeyes, H. K. Yasuda, Prog. Org. Coat. 2001, 42, 100.
14. H. Yasuda, Q. Yu, Plasma Chem. Plasma Process. 2004, 24, 325.
15. Q. S. Yu, C. Huang, H. K. Yasuda, J. Polym. Sci., Part A: Polym. Chem. 2004, 42, 1042.
16. B. Chapman, "Glow Discharge Processes", Wiley, New York 1980.
17. Q. S. Yu, H. K. Yasuda, J. Vac. Sci. Technol. A 2001, 19, 773.
18. Q. Yu, J. Deffeyes, H. K. Yasuda, Prog. Org. Coat. 2001, 43, 243.
19. Q. Yu, J. Deffeyes, H. K. Yasuda, Prog. Org. Coat. 2002, 44, 37.
20. Q. Yu, H. K. Yasuda, Plasmas Polym. 2002, 7, 41.
21. W.-H. Tao, H. K. Yasuda, Plasma Chem. Plasma Process. 2004, 22, 313.
22. H. K. Yasuda, Plasma Process. Polym. 2005, 2, 293.
23. M. A. Lieberman, A. J. Lichtenberg, "Principles of Plasma Discharges and Materials Processing", 2nd Edition, Wiley, Hoboken 2005.
24. E. Kay, J. Coburn, A. Dilks, "Topics in Current Chemistry", Springer-Verlag, New York 1980.
25. Y. Iriyama, H. Yasuda, J. Polym. Sci., Part A: Polym. Chem. 1992, 30, 1731.
26. T. Masuoka, H. Yasuda, J. Polym. Sci., Polym. Chem. Ed. 1982, 20, 2633.
27. Y. Iriyama, T. Yasuda, D. L. Cho, H. Yasuda, J. Appl. Polym. Sci. 1990, 39, 249.