-
1
-
-
49249095684
-
-
U. K. Mishra, L. Shen, T. E. Kazior, and W. Yi-Feng, Proc. IEEE 96, 287-305 (2008). 10.1109/JPROC.2007.911060
-
(2008)
Proc. IEEE
, vol.96
, pp. 287-305
-
-
Mishra, U.K.1
Shen, L.2
Kazior, T.E.3
Yi-Feng, W.4
-
2
-
-
79959793568
-
-
J. G. Felbinger, M. Fagerlind, O. Axelsson, N. Rorsman, G. Xiang, G. Shiping, W. J. Schaff, and L. F. Eastman, IEEE Electron Device Lett. 32, 889-891 (2011). 10.1109/LED.2011.2143384
-
(2011)
IEEE Electron Device Lett.
, vol.32
, pp. 889-891
-
-
Felbinger, J.G.1
Fagerlind, M.2
Axelsson, O.3
Rorsman, N.4
Xiang, G.5
Shiping, G.6
Schaff, W.J.7
Eastman, L.F.8
-
3
-
-
33745040547
-
-
M. Higashiwaki, N. Onojima, T. Matsui, and T. Mimura, Phys. Status Solidi A 203, 1851-1855 (2006). 10.1002/pssa.200565199
-
(2006)
Phys. Status Solidi A
, vol.203
, pp. 1851-1855
-
-
Higashiwaki, M.1
Onojima, N.2
Matsui, T.3
Mimura, T.4
-
4
-
-
79958840715
-
-
F. Medjdoub, M. Zegaoui, N. Rolland, and P. A. Rolland, Appl. Phys. Lett. 98, 223502 (2011). 10.1063/1.3595943
-
(2011)
Appl. Phys. Lett.
, vol.98
, pp. 223502
-
-
Medjdoub, F.1
Zegaoui, M.2
Rolland, N.3
Rolland, P.A.4
-
5
-
-
42349112011
-
-
Y. Cao, K. Wang, A. Orlov, H. Xing, and D. Jena, Appl. Phys. Lett. 92, 152112 (2008). 10.1063/1.2911748
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 152112
-
-
Cao, Y.1
Wang, K.2
Orlov, A.3
Xing, H.4
Jena, D.5
-
6
-
-
84856288618
-
-
H. Tongde, Z. Xueliang, W. Ka Ming, and L. Kei May, IEEE Electron Device Lett. 33, 212-214 (2012). 10.1109/LED.2011.2176909
-
(2012)
IEEE Electron Device Lett.
, vol.33
, pp. 212-214
-
-
Tongde, H.1
Xueliang, Z.2
Ming, W.K.3
May, L.K.4
-
7
-
-
84885092977
-
-
B. S. Eller, J. Yang, and R. J. Nemanich, J. Vac. Sci. Technol., A 31, 050807 (2013). 10.1116/1.4807904
-
(2013)
J. Vac. Sci. Technol., A
, vol.31
, pp. 050807
-
-
Eller, B.S.1
Yang, J.2
Nemanich, R.J.3
-
9
-
-
84881383850
-
-
S. Huang, S. Yang, J. Roberts, and K. J. Chen, Jpn. J. Appl. Phys., Part 1 50 (11), 110202 (2011). 10.7567/JJAP.50.110202
-
(2011)
Jpn. J. Appl. Phys., Part 1
, vol.50
, Issue.11
, pp. 110202
-
-
Huang, S.1
Yang, S.2
Roberts, J.3
Chen, K.J.4
-
10
-
-
84889658918
-
-
Y. Shu, T. Zhikai, W. King-Yuen, L. Yu-Syuan, L. Cheng, L. Yunyou, H. Sen, and K. J. Chen, IEEE Electron Device Lett. 34, 1497-1499 (2013). 10.1109/LED.2013.2286090
-
(2013)
IEEE Electron Device Lett.
, vol.34
, pp. 1497-1499
-
-
Shu, Y.1
Zhikai, T.2
King-Yuen, W.3
Yu-Syuan, L.4
Cheng, L.5
Yunyou, L.6
Sen, H.7
Chen, K.J.8
-
11
-
-
79951884304
-
-
C. Mizue, Y. Hori, M. Miczek, and T. Hashizume, Jpn. J. Appl. Phys., Part 1 50 (2), 021001 (2011). 10.7567/JJAP.50.021001
-
(2011)
Jpn. J. Appl. Phys., Part 1
, vol.50
, Issue.2
, pp. 021001
-
-
Mizue, C.1
Hori, Y.2
Miczek, M.3
Hashizume, T.4
-
12
-
-
77953004956
-
-
D. Gregušová, R. Stoklas, C. Mizue, Y. Hori, J. Novák, T. Hashizume, and P. Kordoš, J. Appl. Phys. 107, 106104 (2010). 10.1063/1.3428492
-
(2010)
J. Appl. Phys.
, vol.107
, pp. 106104
-
-
Gregušová, D.1
Stoklas, R.2
Mizue, C.3
Hori, Y.4
Novák, J.5
Hashizume, T.6
Kordoš, P.7
-
13
-
-
66749171658
-
-
P. Kordoš, R. Stoklas, D. Gregušová, and J. Novak, Appl. Phys. Lett. 94, 223512 (2009). 10.1063/1.3148830
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 223512
-
-
Kordoš, P.1
Stoklas, R.2
Gregušová, D.3
Novak, J.4
-
14
-
-
81155125066
-
-
S. Ganguly, J. Verma, G. Li, T. Zimmermann, H. Xing, and D. Jena, Appl. Phys. Lett. 99, 193504 (2011). 10.1063/1.3658450
-
(2011)
Appl. Phys. Lett.
, vol.99
, pp. 193504
-
-
Ganguly, S.1
Verma, J.2
Li, G.3
Zimmermann, T.4
Xing, H.5
Jena, D.6
-
15
-
-
79960708281
-
-
D. Deen, D. Storm, D. Meyer, D. S. Katzer, R. Bass, S. Binari, and T. Gougousi, Phys. Status Solidi C 8, 2420-2423 (2011). 10.1002/pssc.201001071
-
(2011)
Phys. Status Solidi C
, vol.8
, pp. 2420-2423
-
-
Deen, D.1
Storm, D.2
Meyer, D.3
Katzer, D.S.4
Bass, R.5
Binari, S.6
Gougousi, T.7
-
17
-
-
25144487113
-
-
J. Derluyn, S. Boeykens, K. Cheng, R. Vandersmissen, J. Das, W. Ruythooren, S. Degroote, M. R. Leys, M. Germain, and G. Borghs, J. Appl. Phys. 98, 054501 (2005). 10.1063/1.2008388
-
(2005)
J. Appl. Phys.
, vol.98
, pp. 054501
-
-
Derluyn, J.1
Boeykens, S.2
Cheng, K.3
Vandersmissen, R.4
Das, J.5
Ruythooren, W.6
Degroote, S.7
Leys, M.R.8
Germain, M.9
Borghs, G.10
-
18
-
-
70349659947
-
-
E. Cho, S. Seo, C. Jin, D. Pavlidis, G. Fu, J. Tuerck, and W. Jaegermann, J. Vac. Sci. Technol., B 27, 2079 (2009). 10.1116/1.3186615
-
(2009)
J. Vac. Sci. Technol., B
, vol.27
, pp. 2079
-
-
Cho, E.1
Seo, S.2
Jin, C.3
Pavlidis, D.4
Fu, G.5
Tuerck, J.6
Jaegermann, W.7
-
19
-
-
79551690152
-
-
K. Cheng, S. Degroote, M. Leys, F. Medjdoub, J. Derluyn, B. Sijmus, M. Germain, and G. Borghs, J. Cryst. Growth 315, 204-207 (2011). 10.1016/j.jcrysgro.2010.09.025
-
(2011)
J. Cryst. Growth
, vol.315
, pp. 204-207
-
-
Cheng, K.1
Degroote, S.2
Leys, M.3
Medjdoub, F.4
Derluyn, J.5
Sijmus, B.6
Germain, M.7
Borghs, G.8
-
20
-
-
84893419476
-
-
X. Lu, J. Ma, H. Jiang, and K. May Lau, Appl. Phys. Lett. 104, 032903 (2014). 10.1063/1.4862664
-
(2014)
Appl. Phys. Lett.
, vol.104
, pp. 032903
-
-
Lu, X.1
Ma, J.2
Jiang, H.3
Lau, K.M.4
-
21
-
-
84897992941
-
-
X. Lu, J. Ma, Z. Liu, H. Jiang, T. Huang, and K. M. Lau, Phys. Status Solidi A 211, 775-778 (2014). 10.1002/pssa.201300495
-
(2014)
Phys. Status Solidi A
, vol.211
, pp. 775-778
-
-
Lu, X.1
Ma, J.2
Liu, Z.3
Jiang, H.4
Huang, T.5
Lau, K.M.6
-
22
-
-
77955212187
-
-
M. Fagerlind, F. Allerstam, E. O. Sveinbjornsson, N. Rorsman, A. Kakanakova-Georgieva, A. Lundskog, U. Forsberg, and E. Janzen, J. Appl. Phys. 108, 014508 (2010). 10.1063/1.3428442
-
(2010)
J. Appl. Phys.
, vol.108
, pp. 014508
-
-
Fagerlind, M.1
Allerstam, F.2
Sveinbjornsson, E.O.3
Rorsman, N.4
Kakanakova-Georgieva, A.5
Lundskog, A.6
Forsberg, U.7
Janzen, E.8
-
23
-
-
79958026432
-
-
Y. C. Chang, M. L. Huang, Y. H. Chang, Y. J. Lee, H. C. Chiu, J. Kwo, and M. Hong, Microelectron. Eng. 88, 1207-1210 (2011). 10.1016/j.mee.2011.03.098
-
(2011)
Microelectron. Eng.
, vol.88
, pp. 1207-1210
-
-
Chang, Y.C.1
Huang, M.L.2
Chang, Y.H.3
Lee, Y.J.4
Chiu, H.C.5
Kwo, J.6
Hong, M.7
-
24
-
-
34547842264
-
-
E. Ogawa, T. Hashizume, S. Nakazawa, T. Ueda, and T. Tanaka, Jpn. J. Appl. Phys. 46, L590 (2007). 10.1143/JJAP.46.L590
-
(2007)
Jpn. J. Appl. Phys.
, vol.46
, pp. L590
-
-
Ogawa, E.1
Hashizume, T.2
Nakazawa, S.3
Ueda, T.4
Tanaka, T.5
|