SCOPUS 정보 검색 플랫폼

Soft Matter

Volumn 5, Issue 21, 2009, Pages 4266-4271

Interfacial fluctuations in an ideal block copolymer resist

(4) Bosse, August W a Lin, Eric K a Jones, Ronald L a Karim, Alamgir a,b

a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY (United States)

b University of Akron (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACCURATE MEASUREMENT; ELECTRONICS DEVICES; IDEAL MODEL; IDEAL SYSTEMS; INTER-DOMAIN; INTERFACIAL FLUCTUATIONS; INTERFACIAL ROUGHNESS; INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS; INVERSE POWER LAW; LONG RANGE ORDERS; MESOPHASES; NANOFABRICATION;

BLOCK COPOLYMERS; COMPUTER SIMULATION; PLASTIC PRODUCTS; POWER SPECTRUM; TECHNOLOGICAL FORECASTING;

COPOLYMERIZATION;

EID: 70350089217 PISSN: 1744683X EISSN: 17446848 Source Type: Journal
DOI: 10.1039/b909292g Document Type: Article

Times cited : (16)

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