Small angle x-ray scattering measurements of lithographic patterns with sidewall roughness from vertical standing waves

Applied Physics Letters

Volumn 90, Issue 19, 2007, Pages

  Wang, Chengqing ^a   Jones, Ronald L ^a   Lin, Eric K ^a   Wu, Wen Li ^a   Leu, Jim ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

SIDEWALL ROUGHNESS; STANDING WAVE ROUGHNESS; VERTICAL STANDING WAVES; X-RAY SCATTERING INTENSITY;

LITHOGRAPHY; PHOTORESISTS; SURFACE ROUGHNESS; X RAY SCATTERING;

SURFACE STRUCTURE;

EID: 34248329565     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2737399     Document Type: Article

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