Pattern fidelity in nanoimprinted films using critical dimension small angle x-ray scattering

Journal of Microlithography, Microfabrication and Microsystems

Volumn 5, Issue 1, 2006, Pages

  Jones, Ronald L ^a   Soles, Christopher L ^a   Lin, Eric K ^a   Hu, Walter ^b   Reano, Ronald M ^b,d   Pang, Stella W ^b   Weigand, Steven J ^c   Keane, Denis T ^c   Quintana, John P ^c  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b UNIVERSITY OF MICHIGAN   (United States)

^c ARGONNE NATIONAL LABORATORY   (United States)

^d Ohio State University   (United States)

Author keywords

Critical dimension metrology; Nanoimprint lithography; Sub 100 nm lithography; X ray scattering

Indexed keywords

CRITICAL DIMENSION METROLOGY; HOMOPOLYMERS; NANOIMPRINT LITHOGRAPHY; NANOIMPRINTED FILMS;

ASPECT RATIO; FEATURE EXTRACTION; ION BEAM LITHOGRAPHY; NANOTECHNOLOGY; POLYMERS;

X RAY SCATTERING;

EID: 33748537351     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2170550     Document Type: Article

References (19)

1. M. D. Austin, H. Ge, W. Wu, M. Li, Z. Yu, D. Wasserman, S. A. Lyon, and S. Y. Chou, "Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography," Appl. Phys. Lett. 84(26), 5299-5301 (2004).
2. F. Hua, Y. Sun, A. Gaur, M. A. Meitl, L. Bilhaut, L. Rotkina, J. Wang, P. Geil, M. Shim, and J. A. Rogers, "Polymer imprint lithography with molecular-scale resolution," Nano Lett. 4(12), 2467-2471 (2004).
3. 2004 International Technology Roadmap for Semiconductors, see http://www.public.net/itrs.
4. C. D. Schaper, "Patterned transfer of metallic thin film nanostructures by water-soluble polymer templates," Nano Lett. 3(9), 1305-1309 (2003).
5. H. Kostal, "Nanostructures benefit telecom," OE Mag. 2(8), 18 (2002).
6. K. Watanabe, T. Monta, R. Kometani, T. Hoshino, K. Kondo, K. Kanda, Y. Haruyama, T. Kaito, J. Fujita, M. Ishida, Y. Ochiai, T. Tajima, and S. Matsui, "Nanoimprint using three-dimensional microlens mold made by focused-ion-beam chemical vapor deposition," J. Vac. Sci. Technol B 22(1), 22-26 (2004).
7. H. Cao, Z. Yu, J. Wang, J. O. Tegenfeldt, R. H. Austin, E. Chen, W. Wu, and S. Y. Chou, "Fabrication of 10 nm enclosed nanofluidic channels," Appl. Phys. Lett. 81(1), 174-176 (2002).
8. L. J. Guo, X. Cheng, and C. F. Chou, "Fabrication of size-controllable nanofluidic channels by nanoimprinting and its application for DNA stretching," Nano Lett. 4(1), 69-73 (2004).
9. D. C. Joy and G. F. Lorusso, "Experimental resolution measurement in critical dimension scanning electron microscope metrology," Scanning 25(4), 175-180 (2003).
10. W. D. Yang, J. T. Hu, R. Lowe-Webb, R. Korlahalli, D. Shivaprasad, H. Sasano, W. Liu, and D. S. L. Mui, "Line-profile and critical dimension monitoring using a normal incidence optical CD metrology," IEEE Trans. Semicond. Manuf. 17(4), 564-572 (2004).
11. T. H. Huang and F. L. Terry, "Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ real-time process monitoring," Thin Solid Films 455-456(1), 828-836 (2004).
12. R. L. Jones, T. Hu, E. K. Lin, W. L. Wu, R. Kolb, D. M. Casa, P. J. Bolton, and G. G. Barclay, "Small angle x-ray scattering for sub-100 nm pattern characterization," Appl. Phys. Lett. 83(19), 4059-4061 (2003).
13. T. Hu, R. L. Jones, W. L. Wu, E. K. Lin, Q. Lin, D. Keane, S. Weigand, and J. P. Quintana, "Small angle x-ray scattering metrology for sideweall angle and cross section of nanometer scale line gratings," J. Appl. Phys. 96(4), 1983-1987 (2004).
14. L. J. Heyderman, H. Schift, C. David, J. Gobrecht, and T. Schweizer, "Flow behavior of thin polymer films used for hot embossing lithography," Microelectron. Eng. 54(3-4), 229-245 (2000).
15. H. D. Rowland and W. P. King, "Polymer deformation and filling modes during microembossing," J. Micromech. Microeng. 14(12), 1625-1631 (2004).
16. S. Zankovych, T. Hoffmann, J. Seekamp, J. U. Bruch, and C. M. Sotomayor Torres, "Nanoimprint lithography: challenges and prospects," Nanotechnology 12(2), 91-95 (2001).
17. H. C. Scheer and H. Schulz, "A contribution to the flow behaviour of thin polymer films during hot embossing lithography," Microelectron. Eng. 56(3-4), 311-332 (2001).
18. R. L. Jones, C. L. Soles, T. Hu, E. K. Lin, W. Hu, R. M. Reano, S. W. Pang, and D. M. Casa, Nano Lett. (in press).
19. Commercial equipment and materials are identified in this paper only to adequately specify experimental procedure. In no case does this imply endorsement or recommendation by the National Institute of Standards and Technology.