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Volumn 21, Issue 16, 2011, Pages 5856-5859
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Ultralarge-area block copolymer lithography via soft graphoepitaxy
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Author keywords
[No Author keywords available]
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Indexed keywords
ARF LITHOGRAPHY;
BLOCK COPOLYMER LITHOGRAPHY;
BLOCK COPOLYMER THIN FILMS;
CONVENTIONAL LITHOGRAPHY;
FUNCTIONAL NANOSTRUCTURES;
GRAPHOEPITAXY;
I-LINE LITHOGRAPHY;
LAMELLAR PATTERNS;
MICRO-SCALES;
NANO PATTERN;
PHOTORESIST PATTERNS;
SELF-ASSEMBLED;
ULTRAFINE;
BLOCK COPOLYMERS;
COPOLYMERIZATION;
LITHOGRAPHY;
PHOTORESISTS;
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EID: 79955597252
PISSN: 09599428
EISSN: 13645501
Source Type: Journal
DOI: 10.1039/c0jm04248j Document Type: Article |
Times cited : (39)
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References (25)
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