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Volumn 21, Issue 16, 2011, Pages 5856-5859

Ultralarge-area block copolymer lithography via soft graphoepitaxy

Author keywords

[No Author keywords available]

Indexed keywords

ARF LITHOGRAPHY; BLOCK COPOLYMER LITHOGRAPHY; BLOCK COPOLYMER THIN FILMS; CONVENTIONAL LITHOGRAPHY; FUNCTIONAL NANOSTRUCTURES; GRAPHOEPITAXY; I-LINE LITHOGRAPHY; LAMELLAR PATTERNS; MICRO-SCALES; NANO PATTERN; PHOTORESIST PATTERNS; SELF-ASSEMBLED; ULTRAFINE;

EID: 79955597252     PISSN: 09599428     EISSN: 13645501     Source Type: Journal    
DOI: 10.1039/c0jm04248j     Document Type: Article
Times cited : (39)

References (25)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.