Direct top-down ordering of diblock copolymers through nanoimprint lithography

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 29, Issue 6, 2011, Pages

  Salaun M ^a   Kehagias, N ^b   Salhi, B ^a   Baron, T ^a   Boussey, J ^a   Sotomayor Torres, C M ^b,c,d   Zelsmann, M ^a  

^a CEA GRENOBLE   (France)

^b CATALAN INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY ICN2   (Spain)

^c INSTITUCIÓ CATALANA DE RECERCA I ESTUDIS AVANÇATS ICREA   (Spain)

^d UNIVERSITAT AUTÒNOMA DE BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS;

EXPERIMENTAL CONDITIONS; GRAPHOEPITAXY; LINE FEATURES; SELF ORGANIZING; SELF-ORGANIZE; SURFACE WETTING; THERMAL NANOIMPRINT LITHOGRAPHY; TOPDOWN;

NANOIMPRINT LITHOGRAPHY;

EID: 84255189903     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3662399     Document Type: Review

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