Brushless and controlled microphase separation of lamellar polystyrene-b-polyethylene oxide thin films for block copolymer nanolithography

Journal of Polymer Science, Part B: Polymer Physics

Volumn 50, Issue 13, 2012, Pages 904-909

  Mokarian Tabari, Parvaneh ^a,b   Collins, Timothy W ^a   Holmes, Justin D ^a,b   Morris, Michael A ^a,b  

^a UNIVERSITY COLLEGE CORK   (Ireland)

^b TRINITY COLLEGE DUBLIN   (Ireland)

Author keywords

block copolymer; lamellar poly(styrene b ethylene oxide); nanolithography; self assembly; stepwise thermo solvent annealing; thin films

Indexed keywords

ANNEALING PROCESS; ELECTRONIC DEVICE; ELECTRONIC DEVICE STRUCTURES; EXTERNAL FORCE; INTERFACE ENGINEERING; MINIMUM FEATURE SIZES; NANOWIRE STRUCTURES; OXIDE THIN FILMS; POLY(STYRENE-B-ETHYLENE OXIDE); PREFERENTIAL ADSORPTION; SUBSTRATE PATTERN;

ADSORPTION; BLOCK COPOLYMERS; INTERFACES (MATERIALS); NANOLITHOGRAPHY; NANOWIRES; POLYETHYLENE OXIDES; POLYETHYLENES; POLYSTYRENES; SELF ASSEMBLY; STYRENE; THERMOELECTRIC EQUIPMENT; THIN FILMS;

LAMELLAR STRUCTURES;

EID: 84861598775     PISSN: 08876266     EISSN: 10990488     Source Type: Journal    
DOI: 10.1002/polb.23082     Document Type: Article

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