Large area fabrication of vertical silicon nanowire arrays by silver-assisted single-step chemical etching and their formation kinetics

Nanotechnology

Volumn 25, Issue 17, 2014, Pages

  Srivastava, Sanjay K ^a,b,c   Kumar, Dinesh ^a,b   Schmitt, S W ^c   Sood, K N ^a   Christiansen, S H ^c,d   Singh, P K ^a,b  

^a NATIONAL PHYSICAL LABORATORY   (India)

^b Network of Institutes for Solar Energy (NISE)   (India)

^c MAX PLANCK INSTITUTE FOR THE SCIENCE OF LIGHT   (Germany)

^d HAHN MEITNER INSTITUT   (Germany)

Author keywords

Ag catalyzed etching; antireflection coating; electrochemical cell; silicon nanowires

Indexed keywords

ACTIVATION ENERGY; ANTIREFLECTION COATINGS; ELECTROCHEMICAL CELLS; HYDROFLUORIC ACID; NANOWIRES; SILICON; SILVER; SURFACES; WET ETCHING;

FORMATION KINETICS; MULTI-CRYSTALLINE SILICON; POLISHED SURFACES; SILICON NANOWIRE ARRAYS; SILICON NANOWIRES; SINGLE-STEP PROCESS; SOLUTION TEMPERATURE; VERTICALLY ALIGNED;

SILICON WAFERS;

EID: 84898606332     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/25/17/175601     Document Type: Article

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