Electrochemical deposition of metals onto silicon

Journal of Physics D: Applied Physics

Volumn 31, Issue 16, 1998, Pages 1927-1949

  Oskam, G ^a   Long, J G ^a   Natarajan, A ^a   Searson, P C ^a  

^a Johns Hopkins University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; CHARGE TRANSFER; COPPER PLATING; FILM GROWTH; GOLD PLATING; INTERFACES (MATERIALS); METALLIC FILMS; NUCLEATION; PLATINUM; REACTION KINETICS; SEMICONDUCTING SILICON; SEMICONDUCTOR METAL BOUNDARIES;

ELECTROCHEMICAL DEPOSITION;

ELECTROPLATING;

EID: 0032142495     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/31/16/001     Document Type: Review

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