Effect of etching temperature on the growth of silicon nanowires

Applied Mechanics and Materials

Volumn 138-139, Issue , 2012, Pages 1082-1088

  Liu, Yanli ^a   Zhang, Jian ^a  

^a EAST CHINA NORMAL UNIVERSITY   (China)

Author keywords

Length; Silicon nanowires; Surface morphology; Temperature

Indexed keywords

ASPECT RATIO; MECHANICAL ENGINEERING; MORPHOLOGY; NANOWIRES; SURFACE MORPHOLOGY; TEMPERATURE;

ETCHING TEMPERATURE; LENGTH; NEAR ROOM TEMPERATURE; P-TYPE SUBSTRATES; SILICON NANOWIRES; TEMPERATURE DEPENDENCE;

ETCHING;

EID: 82355181484     PISSN: 16609336     EISSN: 16627482     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/AMM.138-139.1082     Document Type: Conference Paper

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