Ordered arrays of silicon nanowires produced by nanosphere lithography and molecular beam epitaxy

Nano Letters

Volumn 5, Issue 12, 2005, Pages 2524-2527

  Fuhrmann, Bodo ^a   Leipner, Hartmut S ^a   Höche, Hans Reiner ^a   Schubert, Luise ^b   Werner, Peter ^b   Gösele, Ulrich ^b  

^a MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

^b MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

GOLD; LITHOGRAPHY; MOLECULAR BEAM EPITAXY; NANOTECHNOLOGY; SEMICONDUCTOR MATERIALS; SILICON;

GOLD DROPLETS; NANOSPHERE LITHOGRAPHY; ORDERED ARRAYS OF SILICON NANOWIRES;

NANOSTRUCTURED MATERIALS;

GOLD; NANOTUBE; POLYSTYRENE DERIVATIVE; SILICON;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; GOLD; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MOLECULAR CONFORMATION; NANOTECHNOLOGY; NANOTUBES; PARTICLE SIZE; POLYSTYRENES; SILICON; SURFACE PROPERTIES;

EID: 30644457980     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl051856a     Document Type: Article

References (14)

1. Wagner, R. S.; Ellis, W. C. Appl. Phys. Lett. 1964, 4, 89.
2. Bootsma, G. A.; Gassen, H. J. J. Cryst. Growth 1971, 10, 223.
3. Morales, A. M.; Lieber, C. M. Science 1998, 279, 208.
4. Park, H. D.; Hogan, T. P. J. Vac. Sci. Technol., B 2004, 22, 237.
5. Schubert, L.; Werner, P.; Zakharov, N. D.; Gerth, G.; Kolb, F. M.; Long, L.; Gösele, U. Appl. Phys. Lett. 2004, 84, 4968.
6. Alternative Lithography; Sotomayor Torres, C. M., Ed.; Kluwer: Boston, MA, 2003.
7. Fischer, U. C.; Zingsheim, H. P. J. Vac. Sci. Technol. 1981, 19, 881.
8. Deckman, H. W.; Dunsmuir, J. H. Appl. Phys. Lett. 1982, 41, 377.
9. Hulteen, J. C.; Van Duyne, R. P. J. Vac. Sci. Technol., A 1995, 13, 1553.
10. Rybczynski, J.; Hilgendorff, M.; Giersig, M. NATO Sci. Ser., Ser. II 2003, 91, 163.
11. Park, K. H.; Lee, S.; Koh, K. H.; Lacerda, R.; Teo, K. B. K.; Milne, W. I. J. Appl. Phys. 2005, 97, 024311.
12. Hochbaum, A. I.; Fan, R.; He, R.; Yang, P. Nano Lett. 2005, 5, 457.
13. Burmeister, F.; Schäfle, C.; Matthes, T.; Böhmisch, M.; Boneberg, J.; Leiderer, P. Langmuir 1997, 13, 2983.
14. Martensson, T.; Carlberg, P.; Borgström, M.; Montelius, L.; Seifert, W.; Samuelson, L. Nano Lett. 2004, 4, 699.