Atmospheric pressure atomic layer deposition of Al2O3 using trimethyl aluminum and ozone

Langmuir

Volumn 30, Issue 13, 2014, Pages 3741-3748

  Mousa, Moataz Bellah M ^a   Oldham, Christopher J ^a   Parsons, Gregory N ^a  

^a North Carolina State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ATMOSPHERIC PRESSURE; BATCH DATA PROCESSING; DEPOSITION; OZONE; SURFACE REACTIONS;

DEPOSITION PRESSURES; OZONE DECOMPOSITION; PRESSURE AND TEMPERATURE; PRESSURE DEPENDENCE; REACTION MECHANISM; SELF-LIMITING GROWTHS; SURFACE REACTION MECHANISM; TRIMETHYL ALUMINUMS;

ATOMIC LAYER DEPOSITION;

EID: 84897985890     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la500796r     Document Type: Article

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