Patterning, characterization, and chemical sensing applications of graphene nanoribbon arrays down to 5 nm using helium ion beam lithography

ACS Nano

Volumn 8, Issue 2, 2014, Pages 1538-1546

  Abbas, Ahmad N ^a,c   Liu, Gang ^a   Liu, Bilu ^a   Zhang, Luyao ^a   Liu, He ^a   Ohlberg, Douglas ^b   Wu, Wei ^a   Zhou, Chongwu ^a  

^a University of Southern California ^*  (United States)

^b HEWLETT PACKARD LABORATORIES   (United States)

^c KING ABDULAZIZ UNIVERSITY   (Saudi Arabia)

Author keywords

array; field effect transistor; graphene nanoribbon; helium ion beam lithography

Indexed keywords

EID: 84894617377     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn405759v     Document Type: Article

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