Precision cutting and patterning of graphene with helium ions

Nanotechnology

Volumn 20, Issue 45, 2009, Pages

  Bell, D C ^a,b   Lemme, M C ^a   Stern, L A ^c   Williams, J R ^a   Marcus, C M ^a  

^a HARVARD UNIVERSITY   (United States)

^b HARVARD UNIVERSITY   (United States)

^c Carl Zeiss Vision Inc USA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM DOSE; CONTROLLED ALIGNMENT; DIRECT-WRITE LITHOGRAPHY; FEATURE SIZES; GRAPHENES; HELIUM ION; NANOSCALE PATTERNING; PRECISION CUTTING; SAMPLE SURFACE; SHARP EDGES;

COMPUTER CONTROL SYSTEMS; GRAPHITE; HELIUM; IONS; RADIOACTIVITY;

LITHOGRAPHY;

GRAPHENE; HELIUM; SILICON; SILICON DIOXIDE;

ACCURACY; ARTICLE; COMPUTER PROGRAM; MICROSCOPY; NANOTECHNOLOGY; PRIORITY JOURNAL;

EID: 70350608318     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/45/455301     Document Type: Article

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