Large area, few-layer graphene films on arbitrary substrates by chemical vapor deposition

Nano Letters

Volumn 9, Issue 1, 2009, Pages 30-35

  Reina, Alfonso ^a,b   Jia, Xiaoting ^a,b   Ho, John ^a,b   Nezich, Daniel ^a,b   Son, Hyungbin ^a,b   Bulovic, Vladimir ^a,b   Dresselhaus, Mildred S ^a,b   Jing, Kong ^a,b  

^a USA

^b Department of Materials Science and Engineering ^*

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT PRESSURE CHEMICAL VAPOR DEPOSITIONS; AMBIPOLAR; BI LAYERS; GRAPHENE; GRAPHENE LAYERS; LATERAL SIZES; LOW COSTS; NI FILMS; OPTO-ELECTRONIC APPLICATIONS; POLY-CRYSTALLINE; PRE-PATTERNING; TRANSFER CHARACTERISTICS;

FILMS; VAPORS;

CHEMICAL VAPOR DEPOSITION;

GRAPHITE; NANOMATERIAL;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; GAS; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; GASES; GRAPHITE; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MEMBRANES, ARTIFICIAL; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTIES;

EID: 60749107706     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl801827v     Document Type: Article

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