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Materials Research Bulletin

Volumn 51, Issue , 2014, Pages 345-350

Microstructural, optical, and electrical properties of Ni-Al co-doped ZnO films prepared by DC magnetron sputtering

(5) Jo, Young Dae a Hui, K N a Hui, K S b Cho, Y R a Kim, Kwang Ho a

a Pusan National University (South Korea)

b Hanyang University (South Korea)

Author keywords

A. Composites; A. Thin films; B. Sputtering; C. X ray diffraction; D. Optical properties

Indexed keywords

AL-DOPED ZNO FILMS; ARGON ATMOSPHERES; BAND GAP WIDENING; BURSTEIN-MOSS SHIFT; C-AXIS ORIENTATIONS; DC MAGNETRON SPUTTERING; MICRO-STRUCTURAL; STRUCTURE AND ORIENTATION; CO-DOPED ZNO;

ALUMINUM; ELECTRIC PROPERTIES; MAGNETRON SPUTTERING; METALLIC FILMS; NICKEL; X RAY DIFFRACTION; ZINC OXIDE;

SEMICONDUCTOR DOPING;

EID: 84892576952 PISSN: 00255408 EISSN: None Source Type: Journal
DOI: 10.1016/j.materresbull.2013.12.026 Document Type: Article

Times cited : (23)

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