Transparent conducting Si-codoped al-doped ZnO thin films prepared by magnetron sputtering using al-doped ZnO powder targets containing SiC

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 27, Issue 4, 2009, Pages 1001-1005

  Nomoto, Jun Ichi ^a   Miyata, Toshihiro ^a   Minami, Tadatsugu ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AL CONTENT; AL-DOPED ZNO; ATOMIC CARBON; ATOMIC RATIO; CO-DOPED; ELECTRICAL PROPERTY; GLASS SUBSTRATES; HIGH TEMPERATURE; POWDER MIXTURES; POWDER TARGET; RADIO-FREQUENCY-MAGNETRON SPUTTERING; RESISTIVITY DISTRIBUTIONS; SI CONTENT; SPATIAL DISTRIBUTION; SUBSTRATE SURFACE; TARGET EROSION; ZNO;

ALUMINUM; ATOMS; CARBON FILMS; CARRIER CONCENTRATION; CONDUCTIVE FILMS; DOPING (ADDITIVES); ELECTRIC PROPERTIES; FILM PREPARATION; GALVANOMAGNETIC EFFECTS; HALL MOBILITY; MAGNETRONS; POWDERS; SEMICONDUCTING ZINC COMPOUNDS; SILICON; SILICON CARBIDE; SIZE DISTRIBUTION; SUBSTRATES; TARGETS; THIN FILMS; ZINC; ZINC OXIDE;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 67650293615     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3153284     Document Type: Article

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