Effect of oxygen partial pressure on the electrical and optical properties of highly (200) oriented p-type Ni1-x O films by DC sputtering

Journal of Materials Science

Volumn 42, Issue 14, 2007, Pages 5766-5772

  Nandy, Suman ^a   Saha, Biswajit ^a   Mitra, Manoj K ^a   Chattopadhyay, K K ^a  

^a JADAVPUR UNIVERSITY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC CONDUCTIVITY; NANOSTRUCTURES; SPUTTERING; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION;

DEPOSITED FILMS; FILM DEPOSITION; OXYGEN PARTIAL PRESSURE; SPUTTERING GAS MIXTURE;

NICKEL OXIDE;

EID: 34547368249     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-006-1153-x     Document Type: Article

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