Structural and optical characterization of high-quality ZnO thin films deposited by reactive RF magnetron sputtering

Materials Research Bulletin

Volumn 48, Issue 3, 2013, Pages 1093-1098

  Zhang, X L ^a   Hui, K N ^a   Hui, K S ^b   Singh, Jai ^a  

^a Pusan National University   (South Korea)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

A. Oxides; A. Thin films; B. Sputtering; D. Microstructure; D. Optical properties

Indexed keywords

CRYSTALLINE QUALITY; CRYSTALLINE STRUCTURE; GAS-FLOW RATIO; HIGH QUALITY; HIGH TRANSMITTANCE; MICROSTRUCTURAL PARAMETERS; OPTICAL CHARACTERIZATION; OXYGEN CONTENT; PHOTOLUMINESCENCE MEASUREMENTS; PL SPECTROSCOPY; QUARTZ SUBSTRATE; RADIO FREQUENCIES; REACTIVE MAGNETRON SPUTTERING; RF REACTIVE MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; SPUTTERING PROCESS; SPUTTERING VOLTAGE; STRESS AND STRAIN; STRUCTURAL AND OPTICAL PROPERTIES; TRANSPARENT CONDUCTING OXIDE; XRD; ZNO FILMS; ZNO THIN FILM;

DEPOSITS; FILM GROWTH; MAGNETRON SPUTTERING; OPTICAL FILMS; OPTICAL PROPERTIES; QUARTZ; X RAY DIFFRACTION;

METALLIC FILMS;

EID: 84872845337     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.materresbull.2012.11.104     Document Type: Article

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