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Volumn 90, Issue , 2013, Pages 99-106

Operation and stability analysis of bipolar OxRRAM-based Non-Volatile 8T2R SRAM as solution for information back-up

Author keywords

FDSOI; Low leakage; Low power; Non Volatile; NV SRAM; Resistive RAMs

Indexed keywords

FDSOI; LOW LEAKAGE; LOW POWER; NON-VOLATILE; NV-SRAM; RESISTIVE RAMS;

EID: 84887449625     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2013.02.045     Document Type: Article
Times cited : (8)

References (26)
  • 5
    • 74049128293 scopus 로고    scopus 로고
    • Nonvolatile SRAM (NV-SRAM) using functional MOSFET merged with resistive switching devices
    • Yamamoto S, Shuto Y, Sugahara S. Nonvolatile SRAM (NV-SRAM) using functional MOSFET merged with resistive switching devices. In: IEEE CICC; 2009. p. 531-4.
    • (2009) IEEE CICC , pp. 531-534
    • Yamamoto, S.1    Shuto, Y.2    Sugahara, S.3
  • 8
    • 84862685650 scopus 로고    scopus 로고
    • A circuit-level performance, energy, and area model for emerging nonvolatile memory
    • X. Dong, C. Xu, Y. Xie, N.P. Jouppi, and NVSim A circuit-level performance, energy, and area model for emerging nonvolatile memory IEEE Trans Comput-Aided Des Integr Circ Syst 31 7 2012 994 1007
    • (2012) IEEE Trans Comput-Aided des Integr Circ Syst , vol.31 , Issue.7 , pp. 994-1007
    • Dong, X.1    Xu, C.2    Xie, Y.3    Jouppi, N.P.4    Nvsim5
  • 11
    • 77953026233 scopus 로고    scopus 로고
    • Reset-set instability in unipolar resistive-switching memory
    • Ielmini D. Reset-set instability in unipolar resistive-switching memory. IEEE Elect Dev Lett 2010.
    • IEEE Elect Dev Lett 2010
    • Ielmini, D.1
  • 12
    • 84880717767 scopus 로고    scopus 로고
    • Thermal effects and instability in unipolar resistive switching devices
    • Chen A, Lin M-R. Thermal effects and instability in unipolar resistive switching devices. In: Device research conference (DRC); 2011.
    • (2011) Device Research Conference (DRC)
    • Chen, A.1    Lin, M.-R.2
  • 13
    • 0042912833 scopus 로고    scopus 로고
    • Simulation if Intrinsic parameter fluctuations in decananometer and nanometer-scale MOSFETs
    • A. Asenov, A.R. Brown, J.H. Davies, S. Kaya, and G. Slavcheva Simulation if Intrinsic parameter fluctuations in decananometer and nanometer-scale MOSFETs TED 24 2003 1837 1852
    • (2003) TED , vol.24 , pp. 1837-1852
    • Asenov, A.1    Brown, A.R.2    Davies, J.H.3    Kaya, S.4    Slavcheva, G.5
  • 14
    • 33947265310 scopus 로고    scopus 로고
    • Simulation study of individual and combined sources of intrinsic parameter fluctuations in conventional nano-MOSFETs
    • G. Roy, A.R. Brown, F. Adamu-Lema, S. Roy, and A. Asenov Simulation study of individual and combined sources of intrinsic parameter fluctuations in conventional nano-MOSFETs TED 2006 3063 3070
    • (2006) TED , pp. 3063-3070
    • Roy, G.1    Brown, A.R.2    Adamu-Lema, F.3    Roy, S.4    Asenov, A.5
  • 15
    • 44849131962 scopus 로고    scopus 로고
    • Simulation of statistical variability in nano MOSFETs
    • A. Asenov Simulation of statistical variability in nano MOSFETs VLSI Tech Dig 2007 86 87
    • (2007) VLSI Tech Dig , pp. 86-87
    • Asenov, A.1
  • 16
    • 0036247929 scopus 로고    scopus 로고
    • Intrinsic threshold voltage fluctuations in decanano MOSFETs due to local oxide thickness variations
    • DOI 10.1109/16.974757, PII S001893830200240X
    • A. Asenov, S. Kaya, and J.H. Davies Intrinsic voltage fluctuations in Decanano MOSFETs due to local oxide thickness variations TED 2002 112 119 (Pubitemid 34504288)
    • (2002) IEEE Transactions on Electron Devices , vol.49 , Issue.1 , pp. 112-119
    • Asenov, A.1    Kaya, S.2    Davies, J.H.3
  • 17
    • 0042532317 scopus 로고    scopus 로고
    • Intrinsic parameter fluctuations in decananometer MOSFETs introduced by gate line edge roughness
    • A. Asenov, S. Kaya, and A.R. Brown Intrinsic parameter fluctuations in decananometer MOSFETs introduced by gate line edge roughness TED 2003 1254 1260
    • (2003) TED , pp. 1254-1260
    • Asenov, A.1    Kaya, S.2    Brown, A.R.3
  • 25
    • 48249129194 scopus 로고    scopus 로고
    • Reduction in the reset current in a resistive random access memory consisting of NiO[sub x] brought about by reducing a parasitic capacitance
    • 10.1063/1.2959065
    • K. Kinoshita, K. Tsunoda, Y. Sato, H. Noshiro, S. Yagaki, and M. Aoki Reduction in the reset current in a resistive random access memory consisting of NiO[sub x] brought about by reducing a parasitic capacitance Appl Phys Lett 93 3 2008 033506 10.1063/1.2959065
    • (2008) Appl Phys Lett , vol.93 , Issue.3 , pp. 033506
    • Kinoshita, K.1    Tsunoda, K.2    Sato, Y.3    Noshiro, H.4    Yagaki, S.5    Aoki, M.6
  • 26
    • 79952279993 scopus 로고    scopus 로고
    • Control of filament size and reduction of reset current below 10 μa in NiO resistance switching memories
    • Elsevier Ltd. doi:10.1016/j.sse.2010.11.031
    • Nardi F, Ielmini D, Cagli C, Spiga S, Fanciulli M, Goux L, Wouters DJJ. Control of filament size and reduction of reset current below 10 μA in NiO resistance switching memories. Solid-State Electron 2011;58(1):42-7. Elsevier Ltd. doi:10.1016/j.sse.2010.11.031.
    • (2011) Solid-State Electron , vol.58 , Issue.1 , pp. 42-47
    • Nardi, F.1    Ielmini, D.2    Cagli, C.3    Spiga, S.4    Fanciulli, M.5    Goux, L.6    Wouters, D.J.J.7


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.