A virtual metrology system based on least angle regression and statistical clustering

Applied Stochastic Models in Business and Industry

Volumn 29, Issue 4, 2013, Pages 362-376

  Susto, Gian Antonio ^a   Beghi, Alessandro ^a  

^a UNIVERSITY OF PADOVA   (Italy)

Author keywords

least angle regression; neural networks; semiconductor manufacturing; statistical distance; virtual metrology

Indexed keywords

CHEMICAL VAPOR DEPOSITIONS (CVD); HIGH-QUALITY STANDARDS; INDUSTRIAL PRODUCTION; LEAST ANGLE REGRESSIONS; SEMICONDUCTOR MANUFACTURING; STATISTICAL CLUSTERING; STATISTICAL DISTANCE; VIRTUAL METROLOGY;

CHEMICAL VAPOR DEPOSITION; MEASUREMENTS; MICROELECTRONICS; NEURAL NETWORKS; REGRESSION ANALYSIS; SEMICONDUCTOR DEVICE MANUFACTURE; TOOLS;

UNITS OF MEASUREMENT;

EID: 84882448296     PISSN: 15241904     EISSN: 15264025     Source Type: Journal    
DOI: 10.1002/asmb.1948     Document Type: Article

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