Virtual metrology for plasma etch using tool variables

ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings

Volumn , Issue , 2009, Pages 143-148

  Lynn, Shane ^a   Ringwood, John ^a   Ragnoli, Emanuele ^a   McLoone, Sean ^a   MacGearailt, Niall ^b  

^a NATIONAL UNIVERSITY OF IRELAND   (Ireland)

^b DUBLIN CITY UNIVERSITY   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

ETCH RATES; ETCH TOOLS; PIECE-WISE; PLASMA ETCH; PLASMA ETCH PROCESS; RF MEASUREMENTS; VARIABLE SELECTION; VIRTUAL METROLOGY; WAFER PROCESSING;

PLASMAS;

SILICON WAFERS;

EID: 70350238107     PISSN: 10788743     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ASMC.2009.5155972     Document Type: Conference Paper

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