Virtual metrology and feedback control for semiconductor manufacturing processes using recursive partial least squares

Journal of Process Control

Volumn 18, Issue 10, 2008, Pages 961-974

  Khan, Aftab A ^a   Moyne, J R ^a   Tilbury, D M ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

Advanced process control; EWMA control; Partial least squares; Semiconductor manufacturing; Virtual metrology

Indexed keywords

CONTROL THEORY; CURVE FITTING; ELECTRIC CONDUCTIVITY; FAULT DETECTION; FEEDBACK CONTROL; INDUSTRIAL ENGINEERING; INTELLIGENT CONTROL; LEAST SQUARES APPROXIMATIONS; LINEAR REGRESSION; MEASUREMENTS; MIM DEVICES; MULTIPLEXING; PRODUCTION ENGINEERING; QUALITY CONTROL; RECURSIVE FUNCTIONS; REGRESSION ANALYSIS; SEMICONDUCTING INDIUM; SEMICONDUCTOR MATERIALS;

ADVANCED PROCESS CONTROL; EWMA CONTROL; PARTIAL LEAST SQUARES; SEMICONDUCTOR MANUFACTURING; VIRTUAL METROLOGY;

PROCESS CONTROL;

EID: 56349142439     PISSN: 09591524     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jprocont.2008.04.014     Document Type: Article

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