Multilevel Lasso applied to virtual metrology in semiconductor manufacturing

IEEE International Conference on Automation Science and Engineering

Volumn , Issue , 2011, Pages 244-249

  Pampuri, Simone ^a   Schirru, Andrea ^a   Fazio, Giuseppe ^b   De Nicolao, Giuseppe ^a  

^a UNIVERSITY OF PAVIA   (Italy)

^b Numonyx Italy ^*  (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CONTEXT INFORMATION; COST-INTENSIVE; DATA HETEROGENEITY; FEEDBACK CONTROL LOOPS; HIGH DIMENSIONAL SPACES; MACHINE LEARNING TECHNIQUES; MEASUREMENT DATA; MULTITASK LEARNING; ON-PRODUCT MONITORING; PROCESS DATA; RELIABLE ESTIMATES; SCANNING ELECTRON MICROSCOPE; SEMICONDUCTOR MANUFACTURING; SEMICONDUCTOR MANUFACTURING INDUSTRY; STATE OF THE ART; STATISTICAL MODELS; VIRTUAL METROLOGY;

LEARNING ALGORITHMS; MEASUREMENTS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; STATE FEEDBACK; UNITS OF MEASUREMENT;

QUALITY CONTROL;

EID: 82455219074     PISSN: 21618070     EISSN: 21618089     Source Type: Conference Proceeding    
DOI: 10.1109/CASE.2011.6042425     Document Type: Conference Paper

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