A virtual metrology system for semiconductor manufacturing

Expert Systems with Applications

Volumn 36, Issue 10, 2009, Pages 12554-12561

  Kang, Pilsung ^a   Lee, Hyoung joo ^b   Cho, Sungzoon ^a   Kim, Dongil ^a   Park, Jinwoo ^c   Park, Chan Kyoo ^d   Doh, Seungyong ^e  

^a Seoul National University   (South Korea)

^b UNIVERSITY OF OXFORD   (United Kingdom)

^c Korea Advanced Institute of Science and Technology   (South Korea)

^d Dongguk University   (South Korea)

^e SAMSUNG Electronics   (South Korea)

Author keywords

Data mining; Dimensionality reduction; Fault detection; Regression; Semiconductor manufacturing; Virtual metrology

Indexed keywords

CYCLE TIME; DATA MINING TECHNIQUES; DIMENSIONALITY REDUCTION; ETCHING PROCESS; IN-BETWEEN; PRODUCT QUALITY; PRODUCT QUALITY MONITORING; PRODUCTION COST; PRODUCTION EQUIPMENTS; PRODUCTION TIME; REGRESSION; RESOURCE CONSUMPTION; SEMICONDUCTOR MANUFACTURING; VIRTUAL METROLOGY;

DATA MINING; FAULT DETECTION; MEASUREMENTS; MINING; QUALITY CONTROL;

SILICON WAFERS;

EID: 69249221367     PISSN: 09574174     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.eswa.2009.05.053     Document Type: Article

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