An approach for factory-wide control utilizing virtual metrology

IEEE Transactions on Semiconductor Manufacturing

Volumn 20, Issue 4, 2007, Pages 364-375

  Khan, Aftab A ^a,b   Moyne, James R ^a   Tilbury, Dawn M ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

^b Advanced Engineering Research Organization   (Pakistan)

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED PROCESS CONTROLS; CONTROL CAPABILITIES; DEVICE SIZES; DYNAMIC ADJUSTMENTS; INTEGRAL PARTS; LONG-TERM SOLUTIONS; MARKET DEMANDS; METROLOGY DATUM; PREDICTION QUALITIES; PREPROCESS; PROCESS DATUM; REAL TIME; RUN-TO-RUN CONTROLS; SEMICONDUCTOR MANUFACTURING INDUSTRIES; TARGET VALUES; TECHNOLOGY TRENDS; VIRTUAL METROLOGIES; WAFER LEVELS; WAFER SIZES;

CHEMICAL PLANTS; FAULT DETECTION; INTELLIGENT CONTROL; MEASUREMENTS; SEMICONDUCTING INDIUM;

PROCESS CONTROL;

EID: 49149109532     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2007.907609     Document Type: Article

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